Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 6/20 | 0.43 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | OPRK1 | P41145 | 4/20 | 0.34 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.34 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.33 |
| ▸ | APOBEC3A | P31941 | 2/20 | 0.33 |
| ▸ | APOBEC3G | Q9HC16 | 2/20 | 0.33 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.32 |
| ▸ | PRCP | P42785 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25475404 | 0.92 | OPRM1 (0.39) | OPRM1HTR2AOPRK1OPRD1APOBEC3A | |
| SCHEMBL25475417 | 0.92 | OPRM1 (0.48) | OPRM1HTR2AOPRK1OPRD1HDAC1 | |
| SCHEMBL23870806 | 0.86 | OPRM1 (0.43) | OPRM1HTR2AOPRK1OPRD1HDAC1 | |
| SCHEMBL26785458 | 0.83 | HTR2A (0.42) | OPRM1HTR2AOPRK1OPRD1HDAC1 | |
| SCHEMBL3908513 | 0.81 | HTR2A (0.46) | OPRM1HTR2AOPRK1OPRD1OPRL1 | |
| SCHEMBL25475401 | 0.81 | KDM1A (0.33) | OPRM1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL24944641 | 0.80 | OPRM1 (0.50) | OPRM1HTR2AOPRK1OPRD1HDAC1 | |
| SCHEMBL25475412 | 0.80 | OPRM1 (0.38) | OPRM1CYP2D6SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL26413266 | 0.79 | OPRM1 (0.49) | OPRM1HTR2AOPRK1OPRD1HDAC1 | |
| SCHEMBL25475405 | 0.78 | MME (0.38) | OPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |