SCHEMBL23870804

SCHEMBL23870804

CC(I)C(=O)OC1(c2ccccc2)CCCNCC1

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.44
HDAC1 Q13547 1/20 0.34
APOBEC3A P31941 1/20 0.34
APOBEC3G Q9HC16 1/20 0.34
ALDH1A1 P00352 1/20 0.33
SLC6A9 P48067 1/20 0.33
OPRD1 P41143 3/20 0.33
OPRK1 P41145 3/20 0.33
HTR2A P28223 1/20 0.33
AKR1C1 Q04828 1/20 0.33
LMNA P02545 1/20 0.32
HPGD P15428 1/20 0.32
TACR1 P25103 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23870805 0.97 OPRM1 (0.43) OPRM1HDAC1APOBEC3AAPOBEC3GALDH1A1
SCHEMBL23870803 0.95 OPRM1 (0.48) OPRM1HDAC1APOBEC3AAPOBEC3GOPRD1
SCHEMBL23870814 0.90 OPRM1 (0.39) OPRM1APOBEC3AAPOBEC3GALDH1A1SLC6A9
SCHEMBL23870806 0.87 OPRM1 (0.43) OPRM1HDAC1APOBEC3AAPOBEC3GOPRD1
SCHEMBL26785460 0.84 OPRM1 (0.43) OPRM1HDAC1OPRD1OPRK1HTR2A
SCHEMBL24944641 0.84 OPRM1 (0.50) OPRM1HDAC1APOBEC3AAPOBEC3GALDH1A1
SCHEMBL25142150 0.83 OPRM1 (0.35) OPRM1
SCHEMBL26413266 0.82 OPRM1 (0.49) OPRM1HDAC1APOBEC3AAPOBEC3GALDH1A1
SCHEMBL23870808 0.82 OPRM1 (0.35) OPRM1ALDH1A1
SCHEMBL25142153 0.82 DRD2 (0.45) OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed