SCHEMBL25480524

SCHEMBL25480524

O=C(OC1CC2CC(CCNS(=O)(=O)C(F)(F)F)CC(C2)C1)c1cc(I)cc(I)c1I

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ CNR1 P21554 1/20 0.32
▸ CNR2 P34972 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23843643 0.89 CNR2 (0.31) CNR1CNR2
SCHEMBL23843635 0.80 CNR2 (0.33) CNR1CNR2
SCHEMBL24055084 0.78 — —
SCHEMBL23843750 0.77 — —
SCHEMBL23830055 0.75 HDAC3 (0.36) —
SCHEMBL24054812 0.74 PGR (0.39) CNR1CNR2
SCHEMBL23843639 0.73 HDAC3 (0.37) —
SCHEMBL26343818 0.73 VCP (0.35) —
SCHEMBL26343823 0.72 SERPINE1 (0.32) —
SCHEMBL23843638 0.72 HDAC3 (0.40) CNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
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