Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ANPEP | P15144 | 1/20 | 0.41 |
| ▸ | NAAA | Q02083 | 2/20 | 0.38 |
| ▸ | ACE | P12821 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | BTK | Q06187 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6863925 | 0.85 | LMNA (0.40) | ANPEPNAAASMN1; SMN2BTKALDH1A1 | |
| SCHEMBL13821877 | 0.80 | BTK (0.41) | ANPEPNAAASMN1; SMN2BTKALDH1A1 | |
| SCHEMBL25946775 | 0.80 | ANPEP (0.36) | ANPEPNAAASMN1; SMN2BTKTSHR | |
| SCHEMBL22279606 | 0.80 | ANPEP (0.36) | ANPEPNAAASMN1; SMN2BTKTSHR | |
| SCHEMBL25527241 | 0.80 | NAAA (0.39) | ANPEPNAAAACESMN1; SMN2TSHR | |
| SCHEMBL5829801 | 0.77 | NAAA (0.58) | NAAASMN1; SMN2ALDH1A1TSHRCYP2C19 | |
| SCHEMBL11590642 | 0.77 | POLB (0.47) | ALDH1A1CYP2C19 | |
| SCHEMBL20858078 | 0.76 | KMT2A (0.42) | SMN1; SMN2ALDH1A1 | |
| SCHEMBL593981 | 0.74 | — | — | |
| SCHEMBL331525 | 0.74 | NAAA (0.46) | NAAASMN1; SMN2ALDH1A1TSHRCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |