SCHEMBL25527241

SCHEMBL25527241

O=C(CCS)OC1CCC(C(=O)O)CC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.39
ANPEP P15144 1/20 0.39
ENPEP Q07075 1/20 0.39
PLG P00747 1/20 0.38
PLAT P00750 1/20 0.38
LMNA P02545 1/20 0.38
GAA P10253 1/20 0.34
MAPT P10636 1/20 0.34
GABRP O00591 1/20 0.33
GABRD O14764 1/20 0.33
GABRA1 P14867 1/20 0.33
TSHR P16473 1/20 0.33
GABRB1 P18505 1/20 0.33
GABRG2 P18507 1/20 0.33
GABRB3 P28472 1/20 0.33
GABRA5 P31644 1/20 0.33
GABRA3 P34903 1/20 0.33
GABRA2 P47869 1/20 0.33
GABRB2 P47870 1/20 0.33
GABRA4 P48169 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL331525 0.88 NAAA (0.46) NAAAGAAMAPTTSHRSMN1; SMN2
SCHEMBL593981 0.88
SCHEMBL25527391 0.85 PLG (0.41) NAAAANPEPENPEPPLGPLAT
SCHEMBL6864567 0.83 LMNA (0.41) NAAAANPEPENPEPPLGPLAT
SCHEMBL28080766 0.81 NAAA (0.41) NAAAGAAMAPTTSHRSMN1; SMN2
SCHEMBL25527237 0.80 ANPEP (0.41) NAAAANPEPTSHRACESMN1; SMN2
SCHEMBL5829801 0.79 NAAA (0.58) NAAALMNATSHRSMN1; SMN2CYP2C19
SCHEMBL12658602 0.79 PLG (0.42) NAAAANPEPENPEPPLGPLAT
SCHEMBL10944117 0.79 PLG (0.42) NAAAANPEPENPEPPLGPLAT
SCHEMBL12658589 0.79 PLG (0.42) NAAAANPEPENPEPPLGPLAT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed