SCHEMBL25527299

SCHEMBL25527299

O=C(O)CC(OC(=O)CCS)C1C=CCCC1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ACE P12821 1/20 0.33
FFAR1 O14842 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527456 0.89 FFAR1 (0.32) FFAR1
SCHEMBL25527405 0.81
SCHEMBL25527281 0.76 ALDH1A1 (0.40) ACEFFAR1
SCHEMBL25527279 0.75 ALDH1A1 (0.42) ACE
SCHEMBL25527278 0.75 ALDH1A1 (0.42) ACE
SCHEMBL25527308 0.71 ACE (0.33) ACE
SCHEMBL11338538 0.69 CYP1A2 (0.36) FFAR1
SCHEMBL25527273 0.67 ALDH1A1 (0.37) ACE
SCHEMBL25527410 0.63 ALDH1A1 (0.42) FFAR1
SCHEMBL2919617 0.63 PSMB1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed