SCHEMBL25527334

SCHEMBL25527334

O=C(CCS)Oc1ccc(C(=O)O)cc1I

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.41
RAB9A P51151 2/20 0.41
KDM4E B2RXH2 1/20 0.41
ALDH1A1 P00352 1/20 0.41
GAA P10253 1/20 0.41
TPMT P51580 3/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA4 P22748 1/20 0.40
CA6 P23280 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
THRA P10827 1/20 0.40
THRB P10828 1/20 0.40
LMNA P02545 1/20 0.37
MAPK1 P28482 1/20 0.37
HTT P42858 1/20 0.37
MGLL Q99685 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527371 0.88 TSHR (0.44) TSHRRAB9AKDM4EALDH1A1GAA
SCHEMBL25527298 0.82 RAB9A (0.55) TSHRRAB9AKDM4EALDH1A1GAA
SCHEMBL25527338 0.76 KDM4E (0.42) TSHRKDM4EALDH1A1GAAFOLH1
SCHEMBL25527398 0.76 TSHR (0.45) TSHRRAB9AKDM4EALDH1A1GAA
SCHEMBL7917235 0.76 TSHR (0.71) TSHRRAB9AKDM4EALDH1A1GAA
SCHEMBL25527234 0.74 HSD17B10 (0.49) TSHRALDH1A1CA1CA2LMNA
SCHEMBL25527340 0.72 F2 (0.45) TSHRALDH1A1THRATHRBHTT
SCHEMBL25527238 0.72 FOLH1 (0.54) RAB9AFOLH1ANPEPENPEP
SCHEMBL30010958 0.72 TPMT (0.69) TSHRRAB9AKDM4EALDH1A1GAA
SCHEMBL787550 0.72 TPMT (0.69) TSHRRAB9AKDM4EALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed