Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | F2 | P00734 | 1/20 | 0.45 |
| ▸ | PLAU | P00749 | 1/20 | 0.45 |
| ▸ | ST14 | Q9Y5Y6 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | CASP6 | P55212 | 1/20 | 0.45 |
| ▸ | THRA | P10827 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | TTR | P02766 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.38 |
| ▸ | PDE4A | P27815 | 1/20 | 0.38 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.38 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.38 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527342 | 0.81 | TPMT (0.43) | PLAUHTTPKM | |
| SCHEMBL25527371 | 0.81 | TSHR (0.44) | TTRHTTALDH1A1TSHR | |
| SCHEMBL566129 | 0.78 | THRA (0.56) | F2PLAUST14POLBCASP6 | |
| SCHEMBL25788111 | 0.75 | THRA (0.68) | THRATHRBALDH1A1HPGDTSHR | |
| SCHEMBL25788106 | 0.75 | THRA (0.68) | THRATHRBALDH1A1HPGDTSHR | |
| SCHEMBL25788104 | 0.75 | THRA (0.68) | THRATHRBALDH1A1HPGDTSHR | |
| SCHEMBL25788109 | 0.75 | THRA (0.68) | THRATHRBALDH1A1HPGDTSHR | |
| SCHEMBL25527374 | 0.75 | ALDH1A1 (0.43) | PKMALDH1A1 | |
| SCHEMBL25527373 | 0.74 | PLA2G2A (0.44) | POLBCASP6HTTPKM | |
| SCHEMBL4948306 | 0.74 | TSHR (0.66) | POLBCASP6THRATHRBTTR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |