SCHEMBL25527338

SCHEMBL25527338

O=C(CCS)Oc1ccc(I)cc1C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.42
MEN1 O00255 1/20 0.42
RECQL P46063 1/20 0.42
KMT2A Q03164 1/20 0.42
CFD P00746 2/20 0.41
PTPRC P08575 1/20 0.39
PTPN2 P17706 1/20 0.39
PTPN1 P18031 1/20 0.39
PTPRA P18433 1/20 0.39
PTPRB P23467 1/20 0.39
PTPRE P23469 1/20 0.39
PTPN6 P29350 1/20 0.39
FOLH1 Q04609 4/20 0.38
ACE P12821 1/20 0.36
HSD17B10 Q99714 3/20 0.35
HPGD P15428 2/20 0.35
MAPT P10636 1/20 0.35
PTGS1 P23219 1/20 0.34
PTGS2 P35354 1/20 0.34
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527382 0.88 CFD (0.43) KDM4EMEN1RECQLKMT2ACFD
SCHEMBL25527347 0.82 ALDH1A1 (0.41) MEN1KMT2APTPRCPTPN2PTPN1
SCHEMBL25527336 0.82 KDM4E (0.46) KDM4EMEN1RECQLKMT2ACFD
SCHEMBL25528393 0.81 CFD (0.38) KDM4EMEN1RECQLKMT2ACFD
SCHEMBL25527334 0.76 TSHR (0.41) KDM4EFOLH1ACEALDH1A1GAA
SCHEMBL25527337 0.76 MAOB (0.37) KDM4EMEN1RECQLKMT2AACE
SCHEMBL1319089 0.76 CFD (0.69) KDM4ECFDPTPRCPTPN2PTPN1
SCHEMBL25527383 0.75 KDM4E (0.41) KDM4EMEN1RECQLKMT2ACFD
SCHEMBL3296817 0.73 PTPRC (0.47) KDM4ECFDPTPRCPTPN2PTPN1
SCHEMBL233846 0.72 APP (0.55) KDM4ECFDPTPRCPTPN2PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed