Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TPMT | P51580 | 2/20 | 0.43 |
| ▸ | PLAU | P00749 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KDM5A | P29375 | 3/20 | 0.33 |
| ▸ | KDM4A | O75164 | 2/20 | 0.33 |
| ▸ | BPTF | Q12830 | 1/20 | 0.32 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ING2 | Q9H160 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527345 | 0.81 | MAOB (0.35) | PLAUKMT2A | |
| SCHEMBL25527340 | 0.81 | F2 (0.45) | PLAUPKMHTT | |
| SCHEMBL25527373 | 0.81 | PLA2G2A (0.44) | TPMTPKMPLA2G2AHTTKMT2A | |
| SCHEMBL25527372 | 0.79 | TPMT (0.49) | TPMTPLAUPKMBPTFKMT2A | |
| SCHEMBL26828022 | 0.79 | TPMT (0.52) | TPMTPLAUPKMPLA2G2ABPTF | |
| SCHEMBL26828029 | 0.77 | POLB (0.50) | TPMTPLAUPLA2G2AHTTKDM5A | |
| SCHEMBL28314163 | 0.76 | TPMT (0.49) | TPMTPLAUPLA2G2ABPTFKMT2A | |
| SCHEMBL6725846 | 0.72 | PLA2G2A (0.64) | PLA2G2AESR1 | |
| SCHEMBL6725404 | 0.72 | TPMT (0.45) | TPMTPLAUPLA2G2A | |
| SCHEMBL25788117 | 0.72 | PLA2G2A (0.64) | PLA2G2AESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |