Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.44 |
| ▸ | DCLRE1B | Q9H816 | 1/20 | 0.41 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.40 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.40 |
| ▸ | LTB4R2 | Q9NPC1 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.39 |
| ▸ | RARA | P10276 | 1/20 | 0.39 |
| ▸ | RARB | P10826 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.37 |
| ▸ | METTL3 | Q86U44 | 2/20 | 0.36 |
| ▸ | METTL14 | Q9HCE5 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527330 | 0.84 | ALDH1A1 (0.46) | ALDH1A1KMT2APTK2BDCLRE1BFFAR4 | |
| SCHEMBL25527377 | 0.83 | TSHR (0.44) | ALDH1A1KMT2APTK2BMEN1 | |
| SCHEMBL25527374 | 0.83 | ALDH1A1 (0.43) | ALDH1A1KMT2APTK2BATMRARA | |
| SCHEMBL25529019 | 0.83 | ALDH1A1 (0.52) | ALDH1A1KMT2A | |
| SCHEMBL25527365 | 0.81 | DCLRE1B (0.42) | ALDH1A1KMT2APTK2BDCLRE1BFFAR4 | |
| SCHEMBL25345347 | 0.80 | ALDH1A1 (0.49) | ALDH1A1KMT2APTK2BFFAR4LTB4R | |
| SCHEMBL12466431 | 0.79 | ALDH1A1 (0.47) | ALDH1A1KMT2APTK2BFFAR4LTB4R | |
| SCHEMBL25527388 | 0.79 | ALDH1A1 (0.46) | ALDH1A1KMT2AMEN1 | |
| SCHEMBL28826108 | 0.76 | KEAP1 (0.46) | ALDH1A1KMT2APTK2BDCLRE1BFFAR4 | |
| SCHEMBL20471860 | 0.75 | PTPN11 (0.52) | KMT2ALTB4RLTB4R2RARARARB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |