SCHEMBL25527397

SCHEMBL25527397

O=C(CS)OCC(=O)Oc1c(I)cc(I)cc1C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.35
POLB P06746 1/20 0.34
NLRP3 Q96P20 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527385 0.90 MAOB (0.39) MAOBPOLBNLRP3
SCHEMBL25528484 0.83 POLB (0.34) MAOBPOLBNLRP3
SCHEMBL25527337 0.81 MAOB (0.37) MAOBPOLBNLRP3
SCHEMBL25527345 0.81 MAOB (0.35) MAOB
SCHEMBL19678546 0.79 MAOB (0.40) MAOBPOLBNLRP3
SCHEMBL19678534 0.78 POLB (0.40) MAOBPOLBNLRP3
SCHEMBL25528393 0.78 CFD (0.38)
SCHEMBL19678548 0.77 MAOB (0.38) MAOBPOLBNLRP3
SCHEMBL25529015 0.75
SCHEMBL19683952 0.74 MAOB (0.36) MAOBPOLBNLRP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed