SCHEMBL25528393

SCHEMBL25528393

O=C(CS)OCC(=O)Oc1ccc(I)cc1C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CFD P00746 2/20 0.38
KDM4E B2RXH2 4/20 0.36
HSD17B10 Q99714 3/20 0.36
ALDH1A1 P00352 1/20 0.36
PTPRC P08575 1/20 0.36
PTPN2 P17706 1/20 0.36
PTPN1 P18031 1/20 0.36
PTPRA P18433 1/20 0.36
PTPRB P23467 1/20 0.36
PTPRE P23469 1/20 0.36
PTPN6 P29350 1/20 0.36
FOLH1 Q04609 4/20 0.35
MEN1 O00255 1/20 0.34
RECQL P46063 1/20 0.34
KMT2A Q03164 1/20 0.34
HPGD P15428 2/20 0.33
MAPT P10636 2/20 0.33
PTGS1 P23219 1/20 0.32
PTGS2 P35354 1/20 0.32
PTGDR2 Q9Y5Y4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527382 0.90 CFD (0.43) CFDKDM4EHSD17B10ALDH1A1PTPRC
SCHEMBL25527338 0.81 KDM4E (0.42) CFDKDM4EHSD17B10ALDH1A1PTPRC
SCHEMBL25527383 0.78 KDM4E (0.41) CFDKDM4EHSD17B10ALDH1A1PTPRC
SCHEMBL25527397 0.78 MAOB (0.35)
SCHEMBL25529018 0.73 CFD (0.31) CFD
SCHEMBL1319089 0.72 CFD (0.69) CFDKDM4EHSD17B10ALDH1A1PTPRC
SCHEMBL25527374 0.72 ALDH1A1 (0.43) KDM4EALDH1A1PTPRCPTPN2PTPN1
SCHEMBL25527368 0.72 KEAP1 (0.46) CFDKDM4EHSD17B10ALDH1A1FOLH1
SCHEMBL3046012 0.71 PTGDR2 (0.54) KDM4EPTPRCPTPN2PTPN1PTPRA
SCHEMBL25527347 0.70 ALDH1A1 (0.41) ALDH1A1PTPRCPTPN2PTPN1PTPRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed