Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.40 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 4/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527915 | 0.85 | CA12 (0.43) | ALDH1A1HPGDKDM4ECA12CA1 | |
| SCHEMBL25737057 | 0.83 | CYP4F2 (0.47) | CYP4F2CYP4A11TSHRALDH1A1SMN1; SMN2 | |
| SCHEMBL25527934 | 0.83 | ALDH1A1 (0.38) | TSHRALDH1A1SMN1; SMN2HPGDKDM4E | |
| SCHEMBL25527929 | 0.83 | MAPK1 (0.38) | TSHRALDH1A1HPGDKMT2APOLB | |
| SCHEMBL20908983 | 0.83 | CYP4F2 (0.46) | CYP4F2CYP4A11TSHRALDH1A1SMN1; SMN2 | |
| SCHEMBL19756060 | 0.83 | CYP4F2 (0.40) | CYP4F2CYP4A11TSHRALDH1A1SMN1; SMN2 | |
| SCHEMBL25527920 | 0.83 | SERPINE1 (0.33) | TSHRALDH1A1 | |
| SCHEMBL18775957 | 0.79 | HPGD (0.52) | TSHRALDH1A1SMN1; SMN2HPGDKMT2A | |
| SCHEMBL18775878 | 0.77 | KMT2A (0.53) | TSHRALDH1A1SMN1; SMN2HPGDKDM4E | |
| SCHEMBL25528078 | 0.75 | SERPINE1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |