SCHEMBL20908983

SCHEMBL20908983

Cc1ccc(Cl)c(C(=O)OCCS(=O)(=O)O)c1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ CYP4F2 P78329 1/20 0.46
▸ CYP4A11 Q02928 1/20 0.46
▸ ALDH1A1 P00352 4/20 0.39
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ CA1 P00915 2/20 0.39
▸ CA2 P00918 2/20 0.39
▸ TSHR P16473 1/20 0.39
▸ CA12 O43570 1/20 0.39
▸ CA9 Q16790 1/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ KDM4E B2RXH2 5/20 0.39
▸ MEN1 O00255 2/20 0.39
▸ LMNA P02545 1/20 0.39
▸ RAB9A P51151 1/20 0.39
▸ POLB P06746 2/20 0.38
▸ MAPT P10636 1/20 0.38
▸ NPC1 O15118 1/20 0.38
▸ HPGD P15428 2/20 0.38
▸ RXFP1 Q9HBX9 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25476191 0.89 NPC1 (0.46) ALDH1A1SMN1; SMN2CA1CA2CA12
SCHEMBL17578250 0.85 MEN1 (0.48) ALDH1A1SMN1; SMN2TSHRKMT2AKDM4E
SCHEMBL20908982 0.84 KLF10 (0.50) CA1CA2CA12CA9KMT2A
SCHEMBL19756060 0.83 CYP4F2 (0.40) CYP4F2CYP4A11ALDH1A1SMN1; SMN2CA1
SCHEMBL25476195 0.83 NPC1 (0.38) ALDH1A1TSHRKMT2AKDM4EMEN1
SCHEMBL25476200 0.83 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2TSHRKMT2AKDM4E
SCHEMBL25527926 0.83 CYP4F2 (0.40) CYP4F2CYP4A11ALDH1A1SMN1; SMN2CA1
SCHEMBL25476209 0.82 MEN1 (0.48) ALDH1A1SMN1; SMN2TSHRKMT2AKDM4E
SCHEMBL25476179 0.81 SERPINE1 (0.51) ALDH1A1CA1CA2TSHRCA12
SCHEMBL25737057 0.81 CYP4F2 (0.47) CYP4F2CYP4A11ALDH1A1SMN1; SMN2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10968175-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-04-06 — — US disclosed
US-20190113843-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-18 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10968175-B2 Resist composition and patterning process HNRNPU, BRWD1, BICRA CYP4F2 4789/4885CYP4A11 4557/4885ALDH1A1 4620/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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