SCHEMBL25527934

SCHEMBL25527934

Bc1ccc(N)c(C(=O)OCCS(=O)(=O)O)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 11/20 0.38
▸ HSD17B10 Q99714 8/20 0.38
▸ HPGD P15428 4/20 0.38
▸ TSHR P16473 4/20 0.38
▸ RAB9A P51151 3/20 0.38
▸ NPC1 O15118 2/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ TDP1 Q9NUW8 2/20 0.38
▸ TP53 P04637 1/20 0.38
▸ GLA P06280 1/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ MAPK1 P28482 1/20 0.38
▸ HIF1A Q16665 1/20 0.38
▸ KDM4E B2RXH2 5/20 0.38
▸ MEN1 O00255 3/20 0.38
▸ KMT2A Q03164 3/20 0.38
▸ NFKB1 P19838 2/20 0.38
▸ NFKB2 Q00653 2/20 0.38
▸ RELA Q04206 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527915 0.85 CA12 (0.43) ALDH1A1HSD17B10HPGDL3MBTL1TDP1
SCHEMBL25737065 0.83 ALDH1A1 (0.44) ALDH1A1HSD17B10HPGDTSHRRAB9A
SCHEMBL18775887 0.83 KEAP1 (0.49) ALDH1A1HSD17B10HPGDTSHRRAB9A
SCHEMBL19756063 0.83 ALDH1A1 (0.38) ALDH1A1HSD17B10HPGDTSHRRAB9A
SCHEMBL25527920 0.83 SERPINE1 (0.33) ALDH1A1TSHRL3MBTL1TDP1GAA
SCHEMBL25476200 0.83 ALDH1A1 (0.42) ALDH1A1HSD17B10HPGDTSHRRAB9A
SCHEMBL25527929 0.83 MAPK1 (0.38) ALDH1A1HSD17B10HPGDTSHRL3MBTL1
SCHEMBL25527926 0.83 CYP4F2 (0.40) ALDH1A1HPGDTSHRSMN1; SMN2KDM4E
SCHEMBL25527928 0.80 ALDH1A1 (0.32) ALDH1A1HSD17B10HPGDTSHRRAB9A
SCHEMBL25527918 0.78 STS (0.40) ALDH1A1TSHRRAB9ANPC1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11703760-B2 Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-18 — — US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11703760-B2 Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process NAF1, PFN1, COL1A1 ALDH1A1 640/4885HSD17B10 4372/4885HPGD 4066/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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