SCHEMBL25528063

SCHEMBL25528063

BCc1c(B)c(CB)c(C(=O)OC#CC(=O)OCCS(=O)(=O)O)c(C(=O)O)c1B

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25913775 0.93 — —
SCHEMBL25476278 0.88 — —
SCHEMBL25528037 0.85 — —
SCHEMBL26758862 0.83 — —
SCHEMBL25528056 0.79 — —
SCHEMBL25913793 0.78 — —
SCHEMBL25528060 0.77 — —
SCHEMBL25527872 0.77 — —
SCHEMBL25527951 0.76 — —
SCHEMBL19756098 0.76 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
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