SCHEMBL2552874

SCHEMBL2552874

Cl[Si](Cl)(Cl)c1cccc2cc3ccccc3cc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.41
KDM4E B2RXH2 4/20 0.41
GAA P10253 3/20 0.41
HSD17B10 Q99714 3/20 0.39
HIF1A Q16665 1/20 0.39
CYP1B1 Q16678 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
MAPT P10636 4/20 0.38
KMT2A Q03164 4/20 0.38
MEN1 O00255 3/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
CYP1A2 P05177 5/20 0.36
ACHE P22303 2/20 0.36
ERBB2 P04626 1/20 0.36
FYN P06241 1/20 0.36
MAOA P21397 1/20 0.36
AHR P35869 1/20 0.36
HPGD P15428 4/20 0.36
GLA P06280 3/20 0.36
NQO2 P16083 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29777502 1.00 ALDH1A1 (0.41) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL15848463 0.83 ALDH1A1 (0.39) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL16487265 0.83 ALDH1A1 (0.39) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL15848065 0.80 ALDH1A1 (0.37) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL1686641 0.80 ALDH1A1 (0.47) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL29777493 0.80 ALDH1A1 (0.47) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL1131122 0.79 CYP2A6 (0.48) ALDH1A1HSD17B10HIF1ACYP1B1MAPT
SCHEMBL15847895 0.79 L3MBTL1 (0.37) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL1686762 0.78 ALDH1A1 (0.46) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL14600079 0.78 ALDH1A1 (0.41) ALDH1A1KDM4EGAAHSD17B10HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116496500-A Combined hard mask and ARC in single layer compositions for KrF microlithography 上海艾深斯科技有限公司 2023-07-28 CN disclosed
CN-109716491-B Method for manufacturing field effect transistor and method for manufacturing wireless communication device 东丽株式会社 2023-06-09 CN disclosed
EP-3514822-B1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES (JP) 2023-04-26 EP disclosed
EP-2553145-B1 ETCH RESISTANT ALUMINA BASED COATINGS PIBOND OY (FI) 2022-09-21 EP disclosed
US-11094899-B2 Method for manufacturing field effect transistor and method for manufacturing wireless communication device TORAY INDUSTRIES, INC. 2021-08-17 US disclosed
EP-3514822-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE Toray Industries, Inc. (JP) 2019-07-24 EP disclosed
US-20190198786-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES, INC. (JP) 2019-06-27 US disclosed
US-20170200615-A1 ETCH RESISTANT ALUMINA BASED COATINGS PIBOND (ZHEJIANG) NEW MATERIALS CO., LTD (CN) 2017-07-13 US disclosed
US-9564339-B2 Etch resistant alumina based coatings PIBOND OY (FI) 2017-02-07 US disclosed
EP-2914664-B1 CURABLE SILICONE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL SEMICONDUCTOR DEVICE DOW CORNING TORAY CO LTD (JP) 2016-09-07 EP disclosed
US-20150252221-A1 Curable Silicone Composition, Cured Product Thereof, And Optical Semiconductor DOW TORAY CO., LTD. (JP) 2015-09-10 US disclosed
EP-2914664-A1 CURABLE SILICONE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL SEMICONDUCTOR DEVICE Dow Corning Toray Co., Ltd. (JP) 2015-09-09 EP disclosed
WO-2014069610-A1 CURABLE SILICONE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL SEMICONDUCTOR DEVICE DOW CORNING TORAY CO., LTD. (JP) 2014-05-08 WO disclosed
US-20130143408-A1 ETCH RESISTANT ALUMINA BASED COATINGS SILECS OY (FI) 2013-06-06 US disclosed
US-8441002-B2 Organic semiconductor composite, organic transistor material and organic field effect transistor TORAY INDUSTRIES, INC. (JP) 2013-05-14 US disclosed
EP-2109162-B1 ORGANIC SEMICONDUCTOR COMPOSITE, ORGANIC TRANSISTOR MATERIAL AND ORGANIC FIELD EFFECT TRANSISTOR TORAY INDUSTRIES (JP) 2013-05-01 EP disclosed
EP-2553145-A1 ETCH RESISTANT ALUMINA BASED COATINGS Silecs OY (FI) 2013-02-06 EP disclosed
WO-2011121166-A1 ETCH RESISTANT ALUMINA BASED COATINGS SILECS OY (FI) 2011-10-06 WO disclosed
US-20100102299-A1 ORGANIC SEMICONDUCTOR COMPOSITE, ORGANIC TRANSISTOR MATERIAL AND ORGANIC FIELD EFFECT TRANSISTOR TORAY INDUSTRIES, INC. (JP) 2010-04-29 US disclosed
EP-2109162-A1 ORGANIC SEMICONDUCTOR COMPOSITE, ORGANIC TRANSISTOR MATERIAL AND ORGANIC FIELD EFFECT TRANSISTOR Toray Industries, Inc. (JP) 2009-10-14 EP disclosed