SCHEMBL2555568

SCHEMBL2555568

CCO[SiH](OCC)C(C)CCN

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
GABRR1 P24046 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL111199 0.86 OPRM1 (0.30)
Ethylenediamine SCHEMBL18241828 0.86 OPRM1 (0.30)
SCHEMBL718355 0.85 CPB2 (0.36)
SCHEMBL2926604 0.83 CPB2 (0.39)
SCHEMBL1608027 0.80 TSHR (0.31)
SCHEMBL10697771 0.80 ALDH1A1 (0.32)
SCHEMBL6708468 0.80
SCHEMBL28425623 0.80 CA12 (0.37)
SCHEMBL14697327 0.78 CA12 (0.39)
SCHEMBL2953427 0.78 CA12 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210189080-A1 COMPOSITION FOR FORMING HARD COAT, METHOD FOR PRODUCING ARTICLE HAVING HARD COAT, HARD COAT, HARD-COATED ARTICLE, AND SILANE-MODIFIED ALICYCLIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-24 US disclosed
CN-108026186-A Modified conjugated diene polymer and preparation method thereof 株式会社LG化学 2018-05-11 CN disclosed
CN-107735470-A Adiabatic coating 富士胶片株式会社 2018-02-23 CN disclosed
CN-107250172-A Modified conjugated diene polymer and its manufacture method and modified conjugated diene polymer composition 旭化成株式会社 2017-10-13 CN disclosed
CN-107209303-A Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2017-09-26 CN disclosed
CN-107074987-A Modified butadiene-based polymers and modifiers for preparing the same LG化学株式会社 2017-08-18 CN disclosed
WO-2017103053-A1 COMPOSITION COMPRISING AT LEAST ONE SULFITE WITH A PH LESS THAN 5.0 L'OREAL (FR) 2017-06-22 WO disclosed
CN-106457305-A Coating process 3M创新有限公司 2017-02-22 CN disclosed
CN-106459369-A Chromate-free pretreatment primer PRC-迪索托国际公司 2017-02-22 CN disclosed
CN-106104835-A Solar cell 富士胶片株式会社 2016-11-09 CN disclosed
EP-2635253-A2 NITROCELLULOSE-FREE NAIL POLISH COMPOSITIONS L'OREAL (FR) 2013-09-11 EP disclosed
EP-2635156-A2 TWO-STEP NAIL POLISH PRODUCT L'OREAL (FR) 2013-09-11 EP disclosed
WO-2013098332-A2 COMPOSITION AND PROCESS FOR REDUCING THE CURL AND FRIZZINESS OF HAIR L'OREAL (FR) 2013-07-04 WO disclosed
CN-102782056-A Nitric oxide-releasing coatings NOVAN INC 2012-11-14 CN disclosed
WO-2012061267-A2 TWO-STEP NAIL POLISH PRODUCT L'OREAL SA (FR) 2012-05-10 WO disclosed
WO-2012061265-A2 NITROCELLULOSE-FREE NAIL POLISH COMPOSITIONS L'OREAL S.A. (FR) 2012-05-10 WO disclosed
WO-2011128309-A1 COMPOSITION AND TREATMENT PROCESS USING PUMICE PARTICLES L'OREAL (FR) 2011-10-20 WO disclosed
EP-2168633-A2 Use of a cosmetic composition comprising organic derivatives of silicium containing at least a basic moiety as pre-treatment before a composition comprising a film-forming hydrophobic polymer, a pigment and a solvent L'OREAL (FR) 2010-03-31 EP disclosed
US-6645643-B2 For plastic packaging material for microelectronic applications STMICROELECTRONICS S.R.L. (IT) 2003-11-11 US disclosed
US-20020022679-A1 For plastic packaging material for microelectronic applications STMICROELECTRONICS S.R.L. (IT) 2002-02-21 US disclosed