SCHEMBL25564136

SCHEMBL25564136

CC(=O)OC1(c2ccc(F)c(F)c2)CCCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 6/20 0.43
SLC6A4 P31645 5/20 0.43
SLC6A2 P23975 5/20 0.43
DRD2 P14416 1/20 0.40
DRD4 P21917 1/20 0.40
DRD3 P35462 1/20 0.40
CCR2 P41597 1/20 0.38
HCAR3 P49019 1/20 0.37
HCAR2 Q8TDS4 1/20 0.37
CHRNA1 P02708 1/20 0.37
CHRNG P07510 1/20 0.37
CHRNB1 P11230 1/20 0.37
CHRNB2 P17787 1/20 0.37
CHRNB4 P30926 1/20 0.37
CHRNA3 P32297 1/20 0.37
CHRNA4 P43681 1/20 0.37
CHRND Q07001 1/20 0.37
HDAC3 O15379 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC2 Q92769 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25564234 0.98 SLC6A3 (0.46) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25564313 0.98 SLC6A3 (0.46) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25564315 0.98 SLC6A3 (0.46) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25564179 0.87 DRD2 (0.35) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25140029 0.85 SLC6A3 (0.40) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25564281 0.85 SLC6A3 (0.37) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25574869 0.84 SLC6A3 (0.40) SLC6A3SLC6A4SLC6A2CCR2HCAR3
SCHEMBL25564130 0.82 DRD2 (0.50) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25564309 0.81 DRD2 (0.49) SLC6A3SLC6A4SLC6A2DRD2DRD4
SCHEMBL25564223 0.81 DRD2 (0.49) SLC6A3SLC6A4SLC6A2DRD2DRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230367213-A1 MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-16 US disclosed
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20230161254-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161254-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed