Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 12/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 11/20 | 0.37 |
| ▸ | DRD2 | P14416 | 1/20 | 0.35 |
| ▸ | DRD4 | P21917 | 1/20 | 0.35 |
| ▸ | DRD3 | P35462 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 7/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564179 | 0.99 | DRD2 (0.35) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564296 | 0.89 | SLC6A3 (0.47) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564270 | 0.89 | SLC6A3 (0.49) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564192 | 0.88 | SLC6A3 (0.45) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564269 | 0.88 | SLC6A3 (0.45) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564169 | 0.87 | SLC6A3 (0.47) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564234 | 0.87 | SLC6A3 (0.46) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564315 | 0.87 | SLC6A3 (0.46) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564313 | 0.87 | SLC6A3 (0.46) | SLC6A3SLC6A4DRD2DRD4DRD3 | |
| SCHEMBL25564136 | 0.85 | SLC6A3 (0.43) | SLC6A3SLC6A4DRD2DRD4DRD3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |