Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC3 | O15379 | 1/20 | 0.44 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.44 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.44 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.44 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.40 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.40 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.40 |
| ▸ | SLC6A9 | P48067 | 2/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 6/20 | 0.39 |
| ▸ | GALR1 | P47211 | 1/20 | 0.38 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | ICMT | O60725 | 1/20 | 0.38 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.38 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.38 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.38 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.38 |
| ▸ | TGM2 | P21980 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564266 | 0.99 | HDAC3 (0.43) | HDAC3HDAC1HDAC2HDAC6TAS1R3 | |
| SCHEMBL25564153 | 0.86 | SLC6A4 (0.37) | HDAC3HDAC1HDAC2HDAC6SLC6A2 | |
| SCHEMBL25564261 | 0.85 | SLC6A4 (0.39) | HDAC3HDAC1HDAC2HDAC6SLC6A9 | |
| SCHEMBL25564148 | 0.83 | SLC6A4 (0.49) | SLC6A2EPHX2TGM2 | |
| SCHEMBL25564249 | 0.82 | SLC6A4 (0.51) | SLC6A9SLC6A2EPHX2 | |
| SCHEMBL25564143 | 0.81 | CCR2 (0.49) | HDAC3HDAC1HDAC2HDAC6SLC6A2 | |
| SCHEMBL25564156 | 0.80 | TSHR (0.40) | SLC6A9SLC6A2EPHX2 | |
| SCHEMBL25564243 | 0.80 | SLC6A4 (0.50) | SLC6A2OPRL1 | |
| SCHEMBL25564138 | 0.79 | SLC6A4 (0.44) | HDAC3HDAC1HDAC2HDAC6SLC6A2 | |
| SCHEMBL25564306 | 0.78 | SLC6A4 (0.47) | HDAC3HDAC1HDAC2HDAC6SLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |