Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 12/20 | 0.51 |
| ▸ | SLC6A3 | Q01959 | 8/20 | 0.51 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.51 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.42 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.41 |
| ▸ | PDE2A | O00408 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.39 |
| ▸ | SLC6A9 | P48067 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564148 | 0.99 | SLC6A4 (0.49) | SLC6A4SLC6A3SLC6A2ADORA3EPHX2 | |
| SCHEMBL25564288 | 0.89 | ADORA3 (0.40) | SLC6A4SLC6A3SLC6A2ADORA3PDE2A | |
| SCHEMBL25564229 | 0.87 | ADORA3 (0.39) | SLC6A4SLC6A3SLC6A2ADORA3PDE2A | |
| SCHEMBL25564668 | 0.87 | SLC6A4 (0.47) | SLC6A4SLC6A3SLC6A2ADORA3EPHX2 | |
| SCHEMBL25564261 | 0.86 | SLC6A4 (0.39) | SLC6A4SLC6A3SLC6A2ADORA3EPHX2 | |
| SCHEMBL25564153 | 0.84 | SLC6A4 (0.37) | SLC6A4SLC6A3SLC6A2ADORA3EPHX2 | |
| SCHEMBL25564266 | 0.84 | HDAC3 (0.43) | SLC6A4SLC6A3SLC6A2SLC6A9 | |
| SCHEMBL25564245 | 0.82 | SLC6A3 (0.46) | SLC6A4SLC6A3SLC6A2PDE2A | |
| SCHEMBL25567442 | 0.82 | SLC6A4 (0.36) | SLC6A4SLC6A3SLC6A2ADORA3POLB | |
| SCHEMBL25564309 | 0.80 | DRD2 (0.49) | SLC6A4SLC6A3SLC6A2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |