Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 3/20 | 0.50 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.50 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.50 |
| ▸ | CCR2 | P41597 | 2/20 | 0.48 |
| ▸ | OPRM1 | P35372 | 3/20 | 0.43 |
| ▸ | OPRL1 | P41146 | 3/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | KDM1A | O60341 | 2/20 | 0.41 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | HCAR3 | P49019 | 1/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564143 | 0.99 | CCR2 (0.49) | SLC6A4SLC6A3SLC6A2CCR2OPRM1 | |
| SCHEMBL25564297 | 0.87 | CCR2 (0.40) | SLC6A4SLC6A3SLC6A2CCR2OPRM1 | |
| SCHEMBL25564255 | 0.86 | CCR2 (0.37) | SLC6A4SLC6A3SLC6A2CCR2HPGD | |
| SCHEMBL25564226 | 0.86 | CCR2 (0.40) | SLC6A4SLC6A3SLC6A2CCR2OPRM1 | |
| Hydrochloric Acid SCHEMBL27626949 | 0.86 | CCR2 (0.46) | SLC6A4SLC6A3SLC6A2CCR2OPRM1 | |
| SCHEMBL25564150 | 0.84 | CCR2 (0.38) | CCR2HPGDMAPT | |
| SCHEMBL25564245 | 0.83 | SLC6A3 (0.46) | SLC6A4SLC6A3SLC6A2OPRM1OPRL1 | |
| SCHEMBL25564306 | 0.82 | SLC6A4 (0.47) | SLC6A4SLC6A3SLC6A2CCR2OPRM1 | |
| SCHEMBL25564238 | 0.82 | SLC6A4 (0.47) | SLC6A4SLC6A3SLC6A2CCR2OPRM1 | |
| SCHEMBL25564318 | 0.82 | SLC6A4 (0.47) | SLC6A4SLC6A3SLC6A2CCR2OPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |