SCHEMBL25590679

SCHEMBL25590679

CCCCC(=O)Oc1c(C)cc(C(c2ccccc2)c2ccccc2)cc1C

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.51
▸ KDM4E B2RXH2 2/20 0.51
▸ MEN1 O00255 2/20 0.51
▸ RECQL P46063 1/20 0.51
▸ SMN1; SMN2 Q16637 3/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ PPARA Q07869 2/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.40
▸ LDHA P00338 1/20 0.39
▸ LDHB P07195 1/20 0.39
▸ AKR1B1 P15121 1/20 0.39
▸ ALOX15 P16050 1/20 0.39
▸ CES2 O00748 1/20 0.38
▸ CES1 P23141 1/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ CYP2D6 P10635 1/20 0.38
▸ CYP2C19 P33261 1/20 0.38
▸ PPARG P37231 1/20 0.37
▸ HTT P42858 1/20 0.37
▸ TDP1 Q9NUW8 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12345948 0.83 BRD4 (0.38) KMT2AKDM4EMEN1RECQLSMN1; SMN2
SCHEMBL26150801 0.78 MEN1 (0.48) KMT2AKDM4EMEN1RECQLSMN1; SMN2
SCHEMBL23271935 0.77 HTT (0.58) KMT2AKDM4EMEN1RECQLSMN1; SMN2
SCHEMBL25715128 0.76 KDM4E (0.45) KMT2AKDM4EMEN1RECQLSMN1; SMN2
SCHEMBL98318 0.74 KDM4E (0.43) KMT2AKDM4EMEN1RECQLSMN1; SMN2
SCHEMBL17123020 0.73 L3MBTL1 (0.44) KMT2AKDM4ESMN1; SMN2L3MBTL1PPARA
SCHEMBL8866848 0.73 ALOX15 (0.46) KMT2AKDM4EMEN1RECQLSMN1; SMN2
SCHEMBL499472 0.73 KMT2A (0.67) KMT2AKDM4EMEN1RECQLSMN1; SMN2
SCHEMBL23271712 0.73 HTT (0.57) KMT2AKDM4EMEN1RECQLPPARA
SCHEMBL30004154 0.73 HTT (0.57) KMT2AKDM4EMEN1RECQLPPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023100574-A1 RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND JSR株式会社 2023-06-08 — — WO disclosed
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