SCHEMBL25633609

SCHEMBL25633609

CN(C)CC(C)(C)C1CCCCCCC1

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 1/20 0.38
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36
LMNA P02545 1/20 0.36
ALOX12 P18054 1/20 0.36
KMT2A Q03164 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
CHRM2 P08172 2/20 0.31
CHRM4 P08173 2/20 0.31
CHRM1 P11229 2/20 0.31
CHRM3 P20309 2/20 0.31
CYP2D6 P10635 1/20 0.30
TSHR P16473 1/20 0.30
CYP1A2 P05177 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26353853 1.00 SIGMAR1 (0.38) SIGMAR1MEN1ALDH1A1LMNAALOX12
SCHEMBL26353220 1.00 SIGMAR1 (0.38) SIGMAR1MEN1ALDH1A1LMNAALOX12
SCHEMBL26353562 1.00 SIGMAR1 (0.38) SIGMAR1MEN1ALDH1A1LMNAALOX12
SCHEMBL26353640 0.98 SIGMAR1 (0.34) SIGMAR1MEN1ALDH1A1LMNAALOX12
SCHEMBL8754575 0.78 SIGMAR1 (0.39) SIGMAR1CYP1A2
SCHEMBL8744370 0.76 NCF1 (0.35) KMT2A
SCHEMBL2994447 0.74 MEN1 (0.40) MEN1ALDH1A1LMNAALOX12KMT2A
SCHEMBL1396813 0.72 ALDH1A1 (0.39) MEN1ALDH1A1LMNAALOX12KMT2A
SCHEMBL9555928 0.72 MEN1 (0.43) SIGMAR1MEN1ALDH1A1LMNAALOX12
SCHEMBL20841523 0.72 MEN1 (0.43) SIGMAR1MEN1ALDH1A1LMNAALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305396-A1 Euv Photoresist With Low-Activation-Energy Ligands Or High-Developer-Solubility Ligands TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-09-28 US disclosed
US-11681221-B2 EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-06-20 US disclosed