Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.30 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.30 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25468020 | 0.87 | GLA (0.33) | MEN1MAPK1KMT2A | |
| SCHEMBL24908658 | 0.75 | ALDH1A1 (0.33) | MEN1MAPK1KMT2A | |
| SCHEMBL47390 | 0.67 | KMT2A (0.35) | MEN1MAPK1KMT2A | |
| SCHEMBL119887 | 0.66 | KMT2A (0.34) | MEN1MAPK1KMT2A | |
| SCHEMBL2740754 | 0.66 | KMT2A (0.34) | MEN1MAPK1KMT2A | |
| SCHEMBL10148640 | 0.66 | KMT2A (0.34) | MEN1MAPK1KMT2A | |
| SCHEMBL332873 | 0.65 | MEN1 (0.36) | MEN1MAPK1KMT2A | |
| SCHEMBL5004303 | 0.65 | MEN1 (0.36) | MEN1MAPK1KMT2A | |
| SCHEMBL17049827 | 0.64 | KMT2A (0.41) | MEN1MAPK1KMT2A | |
| SCHEMBL19978612 | 0.64 | KMT2A (0.33) | MEN1MAPK1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023162565-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023106171-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-06-15 | — | — | WO | disclosed |