Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | THRB | P10828 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5901413 | 0.90 | MEN1 (0.32) | MEN1MAPK1KMT2AALDH1A1 | |
| SCHEMBL5004303 | 0.86 | MEN1 (0.36) | MEN1MAPK1KMT2ACYP17A1CYP19A1 | |
| SCHEMBL16708437 | 0.86 | — | — | |
| SCHEMBL5900845 | 0.85 | — | — | |
| SCHEMBL1027385 | 0.85 | TSHR (0.36) | — | |
| SCHEMBL1028437 | 0.85 | PKM (0.33) | ALDH1A1 | |
| SCHEMBL3165422 | 0.83 | ALDH1A1 (0.30) | ALDH1A1HTT | |
| SCHEMBL16708448 | 0.82 | DPP8 (0.31) | MEN1MAPK1KMT2A | |
| SCHEMBL5419562 | 0.82 | ALDH1A1 (0.38) | KMT2ACYP17A1CYP19A1THRBALDH1A1 | |
| SCHEMBL10027333 | 0.82 | MEN1 (0.33) | MEN1MAPK1KMT2ACYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 310 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1312488-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | claimed |
| US-11680177-B2 | Ink composition | SEIKO EPSON CORPORATION | 2023-06-20 | — | — | US | disclosed |
| US-20200277504-A1 | INK COMPOSITION | SEIKO EPSON CORPORATION (JP) | 2020-09-03 | — | — | US | disclosed |
| US-10423068-B2 | Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2019-09-24 | — | — | US | disclosed |
| US-10414982-B2 | Retardation film, method of manufacturing retardation film, laminate, composition, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| US-20190203065-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-07-04 | — | — | US | disclosed |
| US-20190204741-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS | ROHM & HAAS ELECT MAT (US) | 2019-07-04 | — | — | US | disclosed |
| US-9958775-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask | FUJIFILM CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-9958775-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask | FUJIFILM CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20170242338-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-08-24 | — | — | US | disclosed |
| US-20010044070-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-22 | — | — | US | disclosed |
| US-20010039080-A1 | Chemically amplified positive resist compositon | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033987-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1143299-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-10 | — | — | EP | disclosed |
| CN-1316675-A | Chemical amplifying type positive photoetching rubber composition | SUMITOMO CHEMICAL CO (JP) | 2001-10-10 | — | — | CN | disclosed |
| CN-1312488-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | disclosed |
| EP-1122606-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | disclosed |
| CN-1299079-A | Chemical enlargement type positive photoetching gum compositions | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | CN | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |
| CN-1218391-A | High lather styling shampoo | PROCTER & GAMBLE (US) | 1999-06-02 | — | — | CN | disclosed |