Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TTR | P02766 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | SLC29A1 | Q99808 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trolamine SCHEMBL27529665 | 0.91 | KDM4E (0.36) | MAPTKDM4EALDH1A1ALOX15SMN1; SMN2 | |
| Trolamine SCHEMBL28239214 | 0.87 | KDM4E (0.32) | MAPTKDM4EALOX15SMN1; SMN2 | |
| Trolamine SCHEMBL7554336 | 0.86 | MAPT (0.44) | MAPTKDM4EALDH1A1ALOX15SMN1; SMN2 | |
| Trolamine SCHEMBL923682 | 0.86 | MAPT (0.44) | MAPTKDM4EALDH1A1ALOX15SMN1; SMN2 | |
| Trolamine SCHEMBL5943568 | 0.86 | MAPT (0.44) | MAPTKDM4EALDH1A1ALOX15SMN1; SMN2 | |
| Trolamine SCHEMBL28203422 | 0.85 | ALDH1A1 (0.44) | MAPTKDM4EALDH1A1ALOX15SMN1; SMN2 | |
| Trolamine SCHEMBL29028255 | 0.82 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL29180603 | 0.82 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL5144437 | 0.82 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL15845959 | 0.82 | MAPT (0.47) | MAPTKDM4EALDH1A1ALOX15SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1400856-B1 | Method of making lithographic printing plate | FUJIFILM CORP (JP) | 2011-11-02 | — | — | EP | claimed |
| US-7081330-B2 | Method of making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-07-25 | — | — | US | claimed |
| US-20040063036-A1 | Method of making lithographic printing plate | FUJI PHOTO FILM CO., LTD. | 2004-04-01 | — | — | US | claimed |
| EP-1400856-A2 | Method of making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-24 | — | — | EP | claimed |
| US-9152052-B2 | Composition for forming tungsten oxide film and method for producing tungsten oxide film using same | MERCK PATENT GMBH (DE) | 2015-10-06 | — | — | US | disclosed |
| US-20140356792-A1 | COMPOSITION FOR FORMING TUNGSTEN OXIDE FILM AND METHOD FOR PRODUCING TUNGSTEN OXIDE FILM USING SAME | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-12-04 | — | — | US | disclosed |
| US-20090238875-A1 | Chitosan or Hyaluronic Acid-Poly(Ethylene Oxide)-and Chitosan-Hyaluronic Acid-Poly(Ethylene Oxide)-Based Hydrogel and Manufacturing Method Therefor | SEOUL NATIONAL UNIVERSITY OF TECHNOLOGY CENTER FOR INDUSTRY COLLABORATION (KR) | 2009-09-24 | — | — | US | disclosed |
| EP-0843218-B1 | Photosensitive composition | FUJIFILM CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| WO-2007083870-A1 | CHITOSAN OR HYALURONIC ACID-POLY(ETHYLENE OXIDE)- AND CHITOSAN-HYALURONIC ACID-POLY(ETHYLENE OXIDE)-BASED HYDROGEL AND MANUFACTURING METHOD THEREFOR | SEOUL NATIONAL UNIVERSITY OF TECHNOLOGY CENTER FOR INDUSTRY COLLABORATION (KR) | 2007-07-26 | — | — | WO | disclosed |
| CN-1323852-C | Original edition of lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2007-07-04 | — | — | CN | disclosed |
| EP-1170149-B1 | Preparation method for lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2005-10-19 | — | — | EP | disclosed |
| EP-1258369-B1 | A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser | FUJI PHOTO FILM CO LTD (JP) | 2005-03-30 | — | — | EP | disclosed |
| US-6277541-B1 | MULTILAYER; ALUMINUM, ALUMINA AND ALKALI-SOLUBLE POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6132931-A | A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-6114089-A | COMPRISING AN ALUMINUM SUBSTRATE AND A POSITIVE WORKING PHOTOSENSITIVE LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 2000-09-05 | — | — | US | disclosed |
| EP-0965887-A1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-12-22 | — | — | EP | disclosed |
| EP-0909657-A2 | A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser | FUJI PHOTO FILM CO., LTD (JP) | 1999-04-21 | — | — | EP | disclosed |
| EP-0904954-A2 | Positive working photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-03-31 | — | — | EP | disclosed |
| EP-0871070-A2 | Positive working photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1998-10-14 | — | — | EP | disclosed |
| EP-0843218-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |