SCHEMBL25699013

SCHEMBL25699013

C=C(C)C(=O)OC1(c2cccs2)CCCCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 1/20 0.41
SLC6A2 P23975 1/20 0.40
SLC6A4 P31645 1/20 0.40
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
PRCP P42785 1/20 0.39
SIGMAR1 Q99720 1/20 0.39
CHRM3 P20309 1/20 0.39
LMNA P02545 2/20 0.37
TSHR P16473 1/20 0.37
HDAC3 O15379 1/20 0.37
HDAC1 Q13547 1/20 0.37
HDAC2 Q92769 1/20 0.37
HDAC6 Q9UBN7 1/20 0.37
HSD11B1 P28845 1/20 0.36
CTSD P07339 1/20 0.34
BACE1 P56817 1/20 0.34
GRM5 P41594 1/20 0.34
MAPT P10636 1/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20887794 0.99 SLC6A3 (0.39) SLC6A3SLC6A2SLC6A4KMT2AMEN1
SCHEMBL20887808 0.88 LMNA (0.34) SLC6A3SLC6A2SLC6A4KMT2AMEN1
SCHEMBL20887805 0.86 LMNA (0.45) KMT2ALMNAMAPTALDH1A1
SCHEMBL20887804 0.86 KCNA3 (0.42) SLC6A3SLC6A2SLC6A4KMT2ALMNA
SCHEMBL14665596 0.82 ELANE (0.35) SLC6A3SLC6A2SLC6A4KMT2AMEN1
SCHEMBL20887807 0.82 LMNA (0.41) KMT2ALMNAMAPTALDH1A1
SCHEMBL1130178 0.77 AKR1C1 (0.42) KMT2AMEN1CHRM3
SCHEMBL13347349 0.75 AKR1C1 (0.43) KMT2AMEN1PRCPSIGMAR1ALDH1A1
SCHEMBL25468051 0.75 SLC6A2 (0.40) SLC6A3SLC6A2SLC6A4KMT2AMEN1
SCHEMBL20887810 0.73 TP53 (0.36) SLC6A2SLC6A4KMT2ALMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed