Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.43 |
| ▸ | ELANE | P08246 | 1/20 | 0.43 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.39 |
| ▸ | OPRM1 | P35372 | 4/20 | 0.38 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.38 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.38 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.38 |
| ▸ | APOBEC3A | P31941 | 2/20 | 0.37 |
| ▸ | APOBEC3G | Q9HC16 | 2/20 | 0.37 |
| ▸ | DRD3 | P35462 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | PRCP | P42785 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1130178 | 0.98 | AKR1C1 (0.42) | AKR1C1ELANEHDAC4OPRM1OPRL1 | |
| SCHEMBL24944261 | 0.86 | OPRM1 (0.46) | ELANEOPRM1OPRL1OPRD1OPRK1 | |
| SCHEMBL10311814 | 0.86 | ALDH1A1 (0.43) | ELANEOPRM1OPRD1OPRK1L3MBTL1 | |
| SCHEMBL10062522 | 0.86 | CA1 (0.38) | ELANEOPRM1DRD3L3MBTL1KMT2A | |
| SCHEMBL25698983 | 0.86 | ESR2 (0.42) | ELANEMEN1KMT2AALDH1A1 | |
| SCHEMBL25699046 | 0.84 | OPRM1 (0.41) | AKR1C1ELANEOPRM1OPRD1OPRK1 | |
| SCHEMBL25960355 | 0.84 | OPRM1 (0.35) | ELANEOPRM1KMT2ASIGMAR1 | |
| SCHEMBL23747230 | 0.84 | CYP19A1 (0.40) | ELANEMEN1KMT2AALDH1A1 | |
| SCHEMBL25564653 | 0.84 | HSD11B1 (0.41) | OPRM1DRD3ALDH1A1 | |
| SCHEMBL10062521 | 0.84 | CA1 (0.38) | ELANEOPRM1DRD3L3MBTL1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| WO-2024150553-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | JSR株式会社 | 2024-07-18 | — | — | WO | disclosed |
| US-20240241440-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| WO-2024142681-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024127808-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20160357111-A1 | COMPOSITIONS AND METHODS FOR PATTERN TREATMENT | DOW GLOBAL TECHNOLOGIES LLC | 2016-12-08 | — | — | US | disclosed |
| US-20160357111-A1 | COMPOSITIONS AND METHODS FOR PATTERN TREATMENT | DOW GLOBAL TECHNOLOGIES LLC | 2016-12-08 | — | — | US | disclosed |
| US-20160357109-A1 | PATTERN TREATMENT METHODS | DOW GLOBAL TECHNOLOGIES LLC | 2016-12-08 | — | — | US | disclosed |
| US-20160357109-A1 | PATTERN TREATMENT METHODS | DOW GLOBAL TECHNOLOGIES LLC | 2016-12-08 | — | — | US | disclosed |
| US-20160209745-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160209745-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20100129738-A1 | POSITIVE RESIST COMPOSITION AND PATTERING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |
| US-20100129738-A1 | POSITIVE RESIST COMPOSITION AND PATTERING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | AKR1C1 425/4885ELANE 1993/4885HDAC4 2804/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | AKR1C1 1297/4885ELANE 1902/4885HDAC4 4428/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.