SCHEMBL25701252

SCHEMBL25701252

CC1C2CC3(C(F)(F)F)C(=O)OC1C3O2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12753597 0.83 — —
SCHEMBL25701255 0.76 — —
SCHEMBL12829187 0.74 PPARG (0.31) —
SCHEMBL12832727 0.74 — —
SCHEMBL17853715 0.73 UBE2D3 (0.31) —
SCHEMBL25701242 0.73 UBE2D3 (0.31) —
SCHEMBL12753599 0.70 HMGCR (0.33) —
SCHEMBL12829184 0.70 — —
SCHEMBL25701231 0.70 — —
SCHEMBL25701939 0.69 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230205084-A1 RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2023-06-29 — — US disclosed
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