SCHEMBL25701883

SCHEMBL25701883

COC12CC3CC(OC1=O)C2C3(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25701904 0.83 — —
SCHEMBL25701857 0.70 — —
SCHEMBL25701227 0.67 — —
SCHEMBL11406066 0.62 — —
SCHEMBL25701230 0.61 — —
SCHEMBL25701229 0.57 — —
SCHEMBL22043709 0.56 — —
SCHEMBL5423040 0.56 CYP19A1 (0.33) —
SCHEMBL25701226 0.56 — —
SCHEMBL13057393 0.55 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230205084-A1 RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2023-06-29 — — US disclosed
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