SCHEMBL25736699

SCHEMBL25736699

CC(C)(C)OC(=O)Nc1ccc(OC(=O)CCS)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 1/20 0.52
PPARA Q07869 1/20 0.52
LIPE Q05469 1/20 0.46
CYP17A1 P05093 2/20 0.46
KMT2A Q03164 3/20 0.45
ALDH1A1 P00352 2/20 0.45
MAPT P10636 2/20 0.45
LMNA P02545 1/20 0.45
HTT P42858 1/20 0.45
HSD17B10 Q99714 1/20 0.45
MEN1 O00255 2/20 0.43
KDM4E B2RXH2 1/20 0.43
GLA P06280 1/20 0.43
GAA P10253 1/20 0.43
HPGD P15428 1/20 0.43
HIF1A Q16665 1/20 0.43
PSMB8 P28062 1/20 0.41
NAMPT P43490 1/20 0.41
MAPKAPK2 P49137 4/20 0.41
MAP4K4 O95819 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25736722 0.89 PPARG (0.54) PPARGPPARALIPECYP17A1KMT2A
SCHEMBL27474162 0.87 PPARG (0.56) PPARGPPARALIPECYP17A1KMT2A
SCHEMBL25736700 0.84 ALDH1A1 (0.49) CYP17A1KMT2AALDH1A1MAPTMEN1
SCHEMBL1000733 0.84 PPARG (0.58) PPARGPPARALIPECYP17A1KMT2A
SCHEMBL1162988 0.79 LIPE (0.52) PPARGPPARALIPECYP17A1KMT2A
SCHEMBL4636496 0.79 LIPE (0.52) PPARGPPARALIPECYP17A1KMT2A
SCHEMBL6665914 0.79 LIPE (0.52) PPARGPPARALIPECYP17A1KMT2A
SCHEMBL13055402 0.78 CYP17A1 (0.59) LIPECYP17A1ALDH1A1GAAPSMB8
SCHEMBL18353040 0.78 LIPE (0.51) PPARGPPARALIPECYP17A1KMT2A
SCHEMBL29131710 0.77 HPGD (0.59) PPARGPPARALIPECYP17A1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed