SCHEMBL25736768

SCHEMBL25736768

CC(C)(C)OC(=O)NCc1ccc(C(=O)OCCS)cc1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NAMPT P43490 2/20 0.52
L3MBTL1 Q9Y468 2/20 0.46
HDAC1 Q13547 3/20 0.46
GAA P10253 1/20 0.44
HTT P42858 1/20 0.43
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
HDAC6 Q9UBN7 2/20 0.42
HDAC10 Q969S8 1/20 0.42
MAPT P10636 1/20 0.42
RECQL P46063 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
SDCBP O00560 1/20 0.41
SDC2 P34741 1/20 0.41
ALDH1A1 P00352 1/20 0.41
SERPINE1 P05121 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3905352 0.85 HTT (0.59) NAMPTL3MBTL1HDAC1GAAHTT
SCHEMBL10165179 0.84 NAMPT (0.56) NAMPTL3MBTL1HDAC1GAACA1
SCHEMBL13496840 0.84 NAMPT (0.51) NAMPTL3MBTL1HDAC1GAAHTT
SCHEMBL1206337 0.83 NAMPT (0.55) NAMPTL3MBTL1HDAC1GAACA1
SCHEMBL31249684 0.82 NAMPT (0.49) NAMPTL3MBTL1HDAC1GAAHTT
SCHEMBL3180689 0.81 L3MBTL1 (0.61) NAMPTL3MBTL1HDAC1GAACA1
SCHEMBL25736767 0.81 RAB9A (0.51) NAMPTMAPTRECQLNPSR1ALDH1A1
SCHEMBL8337876 0.81 NAMPT (0.53) NAMPTL3MBTL1HDAC1GAAHTT
SCHEMBL6288470 0.81 SYK (0.57) NAMPTHDAC1GAAMAPTALDH1A1
SCHEMBL21063484 0.81 NAMPT (0.51) NAMPTL3MBTL1HDAC1GAAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed