SCHEMBL25736767

SCHEMBL25736767

CC(C)(C)OC(=O)Nc1ccc(C(=O)OCCS)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 3/20 0.51
NAMPT P43490 2/20 0.50
HPGD P15428 3/20 0.49
ALDH1A1 P00352 3/20 0.49
MAPT P10636 3/20 0.49
MEN1 O00255 2/20 0.49
KMT2A Q03164 2/20 0.49
THRB P10828 1/20 0.49
RECQL P46063 1/20 0.48
CYP17A1 P05093 2/20 0.47
NPC1 O15118 2/20 0.47
MAPK1 P28482 2/20 0.47
PKM P14618 1/20 0.47
HSD17B10 Q99714 1/20 0.47
CASP1 P29466 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.46
PDK1 Q15118 1/20 0.44
PDK2 Q15119 1/20 0.44
PDK3 Q15120 1/20 0.44
PDK4 Q16654 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25736763 0.84 ALDH1A1 (0.57) RAB9ANAMPTHPGDALDH1A1MAPT
SCHEMBL273218 0.84 PDK1 (0.60) RAB9ANAMPTHPGDALDH1A1MAPT
SCHEMBL25736778 0.83 CA12 (0.46) RAB9ANAMPTHPGDALDH1A1CYP17A1
SCHEMBL25012380 0.83 HPGD (0.61) RAB9AHPGDALDH1A1MAPTMEN1
SCHEMBL26785235 0.83 RAB9A (0.48) RAB9ANAMPTHPGDALDH1A1MAPT
SCHEMBL23871236 0.82 PKM (0.49) RAB9ANAMPTHPGDALDH1A1MAPT
SCHEMBL16693231 0.82 RAB9A (0.47) RAB9ANAMPTHPGDALDH1A1MAPT
SCHEMBL16693226 0.82 CYP17A1 (0.49) RAB9ANAMPTHPGDALDH1A1MAPT
SCHEMBL25736768 0.81 NAMPT (0.52) NAMPTALDH1A1MAPTRECQLSMN1; SMN2
SCHEMBL4315966 0.81 MEN1 (0.59) RAB9ANAMPTALDH1A1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed