⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19359968 | 0.73 | — | — | |
| SCHEMBL10632232 | 0.72 | MMP8 (0.32) | — | |
| SCHEMBL5664051 | 0.71 | MAPT (0.33) | — | |
| SCHEMBL10626538 | 0.70 | MMP8 (0.31) | — | |
| SCHEMBL11856180 | 0.70 | MEN1 (0.34) | — | |
| SCHEMBL891679 | 0.69 | MAPT (0.33) | — | |
| SCHEMBL12662631 | 0.68 | MMP8 (0.31) | — | |
| SCHEMBL23505256 | 0.68 | MMP1 (0.31) | — | |
| SCHEMBL1727723 | 0.68 | — | — | |
| SCHEMBL13856097 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020241846-A1 | FILM FORMING COMPOSITION | 花王株式会社 | 2020-12-03 | — | — | WO | claimed |
| CN-103648474-B | Composition of skin cleanser | KAO CORP. (JP) | 2016-04-13 | — | — | CN | claimed |
| EP-1433476-B2 | Skin cleansing composition | KAO CORP (JP) | 2013-07-24 | — | — | EP | claimed |
| CN-100344271-C | Skin cleaning agent composition | KAO CORP (JP) | 2007-10-24 | — | — | CN | claimed |
| EP-1433476-B1 | Skin cleansing composition | KAO CORP (JP) | 2006-03-22 | — | — | EP | claimed |
| US-20040136943-A1 | Skin cleansing composition | KAO CORPORATION (JP) | 2004-07-15 | — | — | US | claimed |
| CN-1511511-A | Skin cleaning agent composition | ������������ʽ���� | 2004-07-14 | — | — | CN | claimed |
| EP-1433476-A2 | Skin cleansing composition | Kao Corporation (JP) | 2004-06-30 | — | — | EP | claimed |
| US-20240189215-A1 | FILM-FORMING COMPOSITION | KAO CORPORATION (JP) | 2024-06-13 | — | — | US | disclosed |
| EP-4117618-B1 | SURFACTANTS FOR PERSONAL CARE AND COSMETIC PRODUCTS | ADVANSIX RESINS & CHEMICALS LLC (US) | 2024-06-12 | — | — | EP | disclosed |
| WO-2024095921-A1 | COMPOSITION | 花王株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024095918-A1 | CLEANING AGENT COMPOSITION | 花王株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024095920-A1 | METHOD FOR REMOVING OILY SOIL FROM SUBJECT SURFACE | 花王株式会社 | 2024-05-10 | — | — | WO | disclosed |
| US-20240065948-A1 | FILM-FORMING COMPOSITION FOR SKIN | KAO CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| EP-1639989-A1 | Microemulsion | Kao Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| CN-1751679-A | Microemulsion | KAO CORP (JP) | 2006-03-29 | — | — | CN | disclosed |
| EP-1433476-B1 | Skin cleansing composition | KAO CORP (JP) | 2006-03-22 | — | — | EP | disclosed |
| US-20040136943-A1 | Skin cleansing composition | KAO CORPORATION (JP) | 2004-07-15 | — | — | US | disclosed |
| CN-1511511-A | Skin cleaning agent composition | ������������ʽ���� | 2004-07-14 | — | — | CN | disclosed |
| EP-1433476-A2 | Skin cleansing composition | Kao Corporation (JP) | 2004-06-30 | — | — | EP | disclosed |