⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25818206 | 0.99 | — | — | |
| SCHEMBL25658020 | 0.80 | HSD11B1 (0.33) | — | |
| SCHEMBL26833219 | 0.77 | HTT (0.34) | — | |
| SCHEMBL25695018 | 0.75 | CLCN2 (0.32) | — | |
| SCHEMBL25694926 | 0.74 | ALDH1A1 (0.47) | — | |
| SCHEMBL25803185 | 0.73 | SLC2A1 (0.43) | — | |
| SCHEMBL25689802 | 0.72 | ALDH1A1 (0.45) | — | |
| SCHEMBL25503527 | 0.72 | CNR1 (0.40) | — | |
| SCHEMBL27436564 | 0.72 | KDM4E (0.31) | — | |
| SCHEMBL25740715 | 0.71 | SLC2A1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |