⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoquinone SCHEMBL3421700 | 0.83 | ALDH1A1 (0.36) | — | |
| Benzoquinone SCHEMBL8597902 | 0.83 | ALDH1A1 (0.36) | — | |
| SCHEMBL5604952 | 0.83 | — | — | |
| SCHEMBL3034904 | 0.79 | CA1 (0.33) | — | |
| SCHEMBL2024330 | 0.79 | — | — | |
| Naphthoquinone SCHEMBL2583577 | 0.77 | CDC25B (0.50) | — | |
| SCHEMBL3034902 | 0.77 | — | — | |
| Naphthoquinone SCHEMBL9190925 | 0.77 | CDC25B (0.50) | — | |
| Hydrochloric Acid SCHEMBL28320820 | 0.77 | — | — | |
| SCHEMBL10728483 | 0.76 | CYP1A2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7172950-B2 | Method for manufacturing semiconductor chip | KANSAI PAINT CO., LTD. (JP) | 2007-02-06 | — | — | US | claimed |
| US-20040192012-A1 | Method for manufacturing semiconductor chip | KANSAI PAINT CO., LTD. (JP) | 2004-09-30 | — | — | US | claimed |
| JP-62244039-A | — | — | None | — | — | JP | disclosed |
| JP-2077750-A | — | — | None | — | — | JP | disclosed |
| JP-6348038-A | — | — | None | — | — | JP | disclosed |
| JP-6003818-A | — | — | None | — | — | JP | disclosed |
| JP-3009360-A | — | — | None | — | — | JP | disclosed |
| JP-7134402-A | — | — | None | — | — | JP | disclosed |
| JP-9194453-A | — | — | None | — | — | JP | disclosed |
| JP-6095376-A | — | — | None | — | — | JP | disclosed |
| JP-61267043-A | — | — | None | — | — | JP | disclosed |
| JP-S62244039-A | POSITIVE TYPE PHOTOSENSITIVE COMPOSITION | FUJI YAKUHIN KOGYO KK | 1987-10-24 | — | — | JP | disclosed |
| JP-S62163055-A | POSITIVE TYPE PHOTOSENSITIVE LITHOGRAPHIC PLATE | MITSUBISHI CHEM IND LTD | 1987-07-18 | — | — | JP | disclosed |
| JP-S62150353-A | PHOTOSENSITIVE LITHOGRAPHIC FORM PLATE | KONISHIROKU PHOTO IND CO LTD | 1987-07-04 | — | — | JP | disclosed |
| JP-S62150354-A | PHOTOSENSITIVE LITHOGRAPHIC FORM PLATE | KONISHIROKU PHOTO IND CO LTD | 1987-07-04 | — | — | JP | disclosed |
| JP-S61267043-A | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | KONISHIROKU PHOTO IND CO LTD | 1986-11-26 | — | — | JP | disclosed |
| US-4504567-A | Light-sensitive lithographic printing plate | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-03-12 | — | — | US | disclosed |
| EP-0123153-A2 | Plate making process using positive working presensitized plate | FUJI PHOTO FILM CO., LTD. (JP) | 1984-10-31 | — | — | EP | disclosed |
| US-4308368-A | PHOTORESISTS, PRINTING PLATES, STORAGE STABILITY | DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 1981-12-29 | — | — | US | disclosed |
| JP-H00695376-A | — | — | 0001-01-01 | — | — | JP | disclosed |