Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 6/20 | 0.54 |
| ▸ | CDC25B | P30305 | 6/20 | 0.54 |
| ▸ | MAOA | P21397 | 3/20 | 0.54 |
| ▸ | MAOB | P27338 | 2/20 | 0.54 |
| ▸ | SNCA | P37840 | 2/20 | 0.54 |
| ▸ | PIN1 | Q13526 | 2/20 | 0.54 |
| ▸ | AKT1 | P31749 | 1/20 | 0.54 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.54 |
| ▸ | EHMT2 | Q96KQ7 | 1/20 | 0.54 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.54 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 8/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.39 |
| ▸ | MAPT | P10636 | 7/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | THRB | P10828 | 4/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.39 |
| ▸ | HPGD | P15428 | 4/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | RECQL | P46063 | 3/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Anthraquinone SCHEMBL23780306 | 0.86 | MEN1 (0.52) | IDO1CDC25BMAOAMAOBMEN1 | |
| Naphthoquinone SCHEMBL2775074 | 0.85 | CDC25B (0.50) | IDO1CDC25BMAOAMAOBSNCA | |
| Naphthoquinone SCHEMBL2583577 | 0.85 | CDC25B (0.50) | IDO1CDC25BMAOAMAOBSNCA | |
| Naphthoquinone SCHEMBL9190925 | 0.85 | CDC25B (0.50) | IDO1CDC25BMAOAMAOBSNCA | |
| 1,2-Naphthoquinone SCHEMBL686745 | 0.84 | PTPRC (0.65) | IDO1CDC25BMAOAMAOBSNCA | |
| Naphthoquinone SCHEMBL8382475 | 0.83 | CDC25B (0.37) | IDO1CDC25BMAOAMAOBSNCA | |
| Phthalic Anhydride SCHEMBL5178869 | 0.81 | TDP1 (0.54) | CDC25BMAOAMEN1KMT2AMAPT | |
| Menadione SCHEMBL5902971 | 0.80 | ALDH1A1 (0.66) | IDO1CDC25BMAOAMAOBSNCA | |
| Naphthoquinone SCHEMBL2583580 | 0.80 | IDO1 (0.44) | IDO1CDC25BMAOAMAOBSNCA | |
| Naphthoquinone SCHEMBL27486918 | 0.80 | IDO1 (0.44) | IDO1CDC25BMAOAMAOBSNCA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2555053-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-18 | — | — | EP | claimed |
| EP-2555053-A1 | Positive-type photosensitive resin composition | Toray Industries, Inc. (JP) | 2013-02-06 | — | — | EP | claimed |
| EP-2110708-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2012-12-05 | — | — | EP | claimed |
| US-8158324-B2 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2012-04-17 | — | — | US | claimed |
| EP-2426557-A1 | PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF | PI R & D Co. Ltd (JP) | 2012-03-07 | — | — | EP | claimed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | claimed |
| EP-2110708-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2009-10-21 | — | — | EP | claimed |
| US-5618932-A | Photoactive compounds and compositions | SHIPLEY COMPANY, L.L.C. (US) | 1997-04-08 | — | — | US | claimed |
| US-5514515-A | Photoactive compounds having a heterocyclic group used in photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 1996-05-07 | — | — | US | claimed |
| US-5124228-A | Based on hydroxy-substituted alkylbenzophenones | SUMITOMO CHEMICAL CO., LTD. (JP) | 1992-06-23 | — | — | US | claimed |
| US-4529682-A | Containing naphthoquinone diazide sulfonyl compound | PHILIP A. HUNT CHEMICAL CORPORATION (US) | 1985-07-16 | — | — | US | claimed |
| JP-57011337-A | — | — | None | — | — | JP | disclosed |
| JP-3145648-A | — | — | None | — | — | JP | disclosed |
| CN-115427470-B | Novolak resin, epoxy resin, photosensitive resin composition, curable resin composition, cured product, electronic device, method for producing novolak resin, and method for producing epoxy resin | 中央硝子株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-115667404-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-05-03 | — | — | CN | disclosed |
| EP-0351849-A2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-01-24 | — | — | EP | disclosed |
| EP-0346808-A2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-12-20 | — | — | EP | disclosed |
| EP-0341608-A2 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-11-15 | — | — | EP | disclosed |
| US-4839256-A | Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-06-13 | — | — | US | disclosed |
| JP-S5711337-A | PHOTOSENSITIVE MATERIAL FOR LITHOGRAPHIC ORIGINAL PLATE | RICOH CO LTD | 1982-01-21 | — | — | JP | disclosed |