Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 3/20 | 0.44 |
| ▸ | CDC25B | P30305 | 2/20 | 0.44 |
| ▸ | MAOA | P21397 | 1/20 | 0.44 |
| ▸ | MAOB | P27338 | 1/20 | 0.44 |
| ▸ | AKT1 | P31749 | 1/20 | 0.44 |
| ▸ | SNCA | P37840 | 1/20 | 0.44 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.44 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.44 |
| ▸ | EHMT2 | Q96KQ7 | 1/20 | 0.44 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.44 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | MAPT | P10636 | 4/20 | 0.33 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | HTT | P42858 | 3/20 | 0.33 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | THRB | P10828 | 2/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthoquinone SCHEMBL28001456 | 0.98 | IDO1 (0.42) | IDO1CDC25BMAOAMAOBAKT1 | |
| Naphthoquinone SCHEMBL6327368 | 0.98 | IDO1 (0.42) | IDO1CDC25BMAOAMAOBAKT1 | |
| Anthraquinone SCHEMBL27945171 | 0.89 | CDC25B (0.41) | IDO1CDC25BMAOAMAOBALDH1A1 | |
| 1,2-Naphthoquinone SCHEMBL5447857 | 0.87 | PTPRC (0.54) | IDO1CDC25BMAOAMAOBAKT1 | |
| 1,2-Naphthoquinone SCHEMBL8376775 | 0.86 | PTPRC (0.53) | IDO1CDC25BMAOAMAOBAKT1 | |
| Naphthoquinone SCHEMBL10743205 | 0.85 | CDC25B (0.48) | IDO1CDC25BMAOAMAOBAKT1 | |
| SCHEMBL27601001 | 0.80 | — | — | |
| Naphthoquinone SCHEMBL106247 | 0.80 | IDO1 (0.54) | IDO1CDC25BMAOAMAOBAKT1 | |
| Benzoquinone SCHEMBL10486821 | 0.80 | ALDH1A1 (0.31) | MAOAMAOBALDH1A1TDP1BCHE | |
| Benzoquinone SCHEMBL6332237 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1782878-B | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES | 2011-08-10 | — | — | CN | claimed |
| CN-1275094-C | Positive-type photosensitive polyimide precursor composition | TORAY INDUSTRIES (JP) | 2006-09-13 | — | — | CN | claimed |
| CN-1782878-A | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES (JP) | 2006-06-07 | — | — | CN | claimed |
| CN-1310809-A | Positive-type photosensitive polyimide precursor composition | TORAY INDUSTRIES (JP) | 2001-08-29 | — | — | CN | claimed |
| US-4791046-A | Process for forming mask patterns of positive type resist material with trimethylsilynitrile | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1988-12-13 | — | — | US | claimed |
| US-4686280-A | Positive type resist material with trimethylsilylnitrile | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1987-08-11 | — | — | US | claimed |
| JP-2001855-A | — | — | None | — | — | JP | disclosed |
| US-20240118616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2024-04-11 | — | — | US | disclosed |
| CN-107703717-B | Positive photosensitive resin composition, method for producing metal wiring, and laminate | 东京应化工业株式会社 | 2023-01-24 | — | — | CN | disclosed |
| CN-107703685-B | Laminate and method for producing laminate | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | disclosed |
| CN-107703658-B | Method for manufacturing substrate | 东京应化工业株式会社 | 2022-02-25 | — | — | CN | disclosed |
| CN-105706000-B | Positive type photosensitive organic compound, used it film manufacturing method and electronic component | 中央硝子株式会社 | 2019-09-27 | — | — | CN | disclosed |
| CN-110073476-A | The thin film transistor base plate and its manufacturing method for having protective film | 默克专利有限公司 | 2019-07-30 | — | — | CN | disclosed |
| CN-1155100-A | Photosensitive composition and photosensitive lithographic printing plate using the same | KONISHIROKU PHOTO IND (JP) | 1997-07-23 | — | — | CN | disclosed |
| EP-0391365-A1 | Process for treating metal surface | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-10 | — | — | EP | disclosed |
| US-4906549-A | Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms | TOKYO OHKA KOGYO CO., LTD. (JP) | 1990-03-06 | — | — | US | disclosed |
| JP-H021855-A | PHOTOSENSITIVE PLANOGRAPHIC PLATE | KONICA CORP | 1990-01-08 | — | — | JP | disclosed |
| US-4804612-A | PLASMA DRY-ETCHING RESISTANCE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1989-02-14 | — | — | US | disclosed |
| US-4791046-A | Process for forming mask patterns of positive type resist material with trimethylsilynitrile | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1988-12-13 | — | — | US | disclosed |
| US-4686280-A | Positive type resist material with trimethylsilylnitrile | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1987-08-11 | — | — | US | disclosed |