Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Naphthoquinone. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA known ✓ | P21397 | 1/20 | 0.42 |
| ▸ | MAOB known ✓ | P27338 | 1/20 | 0.42 |
| ▸ | BCHE known ✓ | P06276 | 1/20 | 0.33 |
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.33 |
| ▸ | IDO1 | P14902 | 3/20 | 0.42 |
| ▸ | CDC25B | P30305 | 2/20 | 0.42 |
| ▸ | AKT1 | P31749 | 1/20 | 0.42 |
| ▸ | SNCA | P37840 | 1/20 | 0.42 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.42 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.42 |
| ▸ | EHMT2 | Q96KQ7 | 1/20 | 0.42 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.42 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | MAPT | P10636 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthoquinone SCHEMBL2583580 | 0.98 | IDO1 (0.44) | IDO1CDC25BMAOAMAOBAKT1 | |
| Naphthoquinone SCHEMBL28001456 | 0.97 | IDO1 (0.42) | IDO1CDC25BMAOAMAOBAKT1 | |
| 1,2-Naphthoquinone SCHEMBL8376775 | 0.88 | PTPRC (0.53) | IDO1CDC25BMAOAMAOBAKT1 | |
| Anthraquinone SCHEMBL27945171 | 0.87 | CDC25B (0.41) | IDO1CDC25BMAOAMAOBMEN1 | |
| 1,2-Naphthoquinone SCHEMBL5447857 | 0.86 | PTPRC (0.54) | IDO1CDC25BMAOAMAOBAKT1 | |
| Naphthoquinone SCHEMBL10743205 | 0.84 | CDC25B (0.48) | IDO1CDC25BMAOAMAOBAKT1 | |
| Benzoquinone SCHEMBL6332237 | 0.80 | — | — | |
| SCHEMBL27601001 | 0.79 | — | — | |
| Naphthoquinone SCHEMBL106247 | 0.79 | IDO1 (0.54) | IDO1CDC25BMAOAMAOBAKT1 | |
| Benzoquinone SCHEMBL10486821 | 0.79 | ALDH1A1 (0.31) | MAOAMAOBALDH1A1TDP1BCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101154040-B | Photoresist composition, its coating method and method of forming photoresist pattern | AZ ELECTRONIC MATERIALS JAPAN | 2012-06-06 | — | — | CN | claimed |
| CN-105706000-B | Positive type photosensitive organic compound, used it film manufacturing method and electronic component | 中央硝子株式会社 | 2019-09-27 | — | — | CN | disclosed |
| CN-105706000-A | Positive photosensitive resin composition, method for producing film using same, and electronic component | 中央硝子株式会社 | 2016-06-22 | — | — | CN | disclosed |
| CN-102985877-B | Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or the photosensitive resin composition film | TORAY INDUSTRIES | 2015-06-10 | — | — | CN | disclosed |
| CN-102985877-A | Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or the photosensitive resin composition film | TORAY INDUSTRIES | 2013-03-20 | — | — | CN | disclosed |
| CN-101154040-B | Photoresist composition, its coating method and method of forming photoresist pattern | AZ ELECTRONIC MATERIALS JAPAN | 2012-06-06 | — | — | CN | disclosed |
| CN-1782878-B | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES | 2011-08-10 | — | — | CN | disclosed |
| CN-1971418-B | Photosensitive resin precursor composition | TORAY INDUSTRIES | 2010-12-01 | — | — | CN | disclosed |
| CN-101154040-A | Photoresist composition, its coating method and method of forming photoresist pattern | AZ ELECTRONIC MATERIALS JAPAN (JP) | 2008-04-02 | — | — | CN | disclosed |
| CN-100347610-C | Positive anticorrosive additive composition and anticorrosive pattern forming method | TOKYO APPLIED CHEMICAL IND CO (JP) | 2007-11-07 | — | — | CN | disclosed |
| US-6933100-B2 | Method of forming a minute resist pattern | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-08-23 | — | — | US | disclosed |
| CN-1633627-A | Photosensitive resin composition | CLARIANT INT LTD (JP) | 2005-06-29 | — | — | CN | disclosed |
| CN-1609708-A | Positive type photoresist composition for manufacturing system LCD, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2005-04-27 | — | — | CN | disclosed |
| CN-1550898-A | Positive anticorrosive additive composition and anticorrosive pattern forming method | 东京应化工业株式会社 | 2004-12-01 | — | — | CN | disclosed |
| CN-1469199-A | Positive photoresist composition and method for forming etch resistant pattern | 东京应化工业株式会社 | 2004-01-21 | — | — | CN | disclosed |
| US-20030108822-A1 | Method of forming a minute resist pattern | CLARIANT FINANCE (BVI) LIMITED | 2003-06-12 | — | — | US | disclosed |
| US-6514676-B1 | Method for forming micropattern of resist | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-02-04 | — | — | US | disclosed |
| CN-1310809-A | Positive-type photosensitive polyimide precursor composition | TORAY INDUSTRIES (JP) | 2001-08-29 | — | — | CN | disclosed |
| EP-1046954-A1 | METHOD FOR FORMING MICROPATTERN OF RESIST | Clariant Finance (BVI) Limited (VG) | 2000-10-25 | — | — | EP | disclosed |
| US-4504567-A | Light-sensitive lithographic printing plate | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-03-12 | — | — | US | disclosed |