Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 15/20 | 0.49 |
| ▸ | PTGS1 | P23219 | 5/20 | 0.49 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.42 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.40 |
| ▸ | FEN1 | P39748 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10296805 | 0.83 | HTT (0.46) | PTGS2PTGS1CA12CA1CA2 | |
| SCHEMBL21701078 | 0.82 | CA12 (0.46) | PTGS2PTGS1SLC6A4CA12CA1 | |
| SCHEMBL12770808 | 0.79 | PKM (0.54) | PTGS2PTGS1CA1CA2HTT | |
| SCHEMBL4569587 | 0.77 | TEAD4 (0.45) | CA12CA1CA2CA7CA13 | |
| SCHEMBL12770795 | 0.77 | PKM (0.53) | PTGS2PTGS1CA12CA1CA2 | |
| SCHEMBL14424439 | 0.77 | HSD17B10 (0.43) | PTGS2PTGS1CA12CA1CA2 | |
| SCHEMBL11547843 | 0.77 | HTT (0.58) | PTGS2PTGS1HTT | |
| SCHEMBL7363510 | 0.76 | SOS1 (0.66) | PTGS2PTGS1SLC6A4 | |
| SCHEMBL10296806 | 0.76 | CA12 (0.49) | CA12CA1CA2CA7CA13 | |
| SCHEMBL12770797 | 0.76 | CA1 (0.46) | PTGS2PTGS1CA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20230266675-A1 | INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR VERIFYING COMPOSITION | FUJIFILM CORPORATION (JP) | 2023-08-24 | — | — | US | disclosed |
| US-11703758-B2 | Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11656548-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-05-23 | — | — | US | disclosed |