Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGDS | O60760 | 1/20 | 0.34 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.32 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.32 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.32 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.32 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | PLK1 | P53350 | 1/20 | 0.30 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25845037 | 0.94 | ESR1 (0.32) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL25844837 | 0.90 | GABRA1 (0.32) | HPGDSGABRA1GABRG2GABRB3GABRA5 | |
| SCHEMBL25844838 | 0.84 | ESR1 (0.32) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL20008839 | 0.81 | GABRA1 (0.35) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL25845038 | 0.78 | HPGDS (0.38) | HPGDSLMNAL3MBTL1HPGDKMT2A | |
| SCHEMBL19756009 | 0.78 | — | — | |
| SCHEMBL20008868 | 0.76 | GABRA1 (0.33) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL25527832 | 0.76 | — | — | |
| SCHEMBL11953038 | 0.76 | ADRB2 (0.41) | L3MBTL1HPGDKMT2APLK1 | |
| SCHEMBL25476135 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |