SCHEMBL25899308

SCHEMBL25899308

O=C1c2ccc(Oc3ccc(Cc4ccc(Oc5ccc6c(c5)C(=O)N(c5cccc(O)c5)C6=O)cc4)cc3)cc2C(=O)N1c1cccc(O)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.64
KMT2A Q03164 4/20 0.64
ALDH1A1 P00352 2/20 0.64
MAPT P10636 2/20 0.64
ESR1 P03372 4/20 0.62
BRD4 O60885 1/20 0.61
NPC1 O15118 1/20 0.56
RAB9A P51151 1/20 0.56
POLB P06746 2/20 0.55
MAPK1 P28482 1/20 0.55
NPSR1 Q6W5P4 1/20 0.49
LPAR1 Q92633 1/20 0.48
LPAR5 Q9H1C0 1/20 0.48
LPAR3 Q9UBY5 1/20 0.48
HTT P42858 1/20 0.48
NR1H3 Q13133 2/20 0.48
KDM4E B2RXH2 1/20 0.48
NR1H2 P55055 1/20 0.47
PKM P14618 1/20 0.47
GRM5 P41594 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24149295 0.91 MEN1 (0.74) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL25899292 0.85 BRD4 (0.57) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL25899305 0.85 ESR1 (0.74) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL25899331 0.83 MEN1 (0.65) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL10641093 0.78 BRD4 (0.65) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL9588495 0.78 ESR1 (1.00) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL19689370 0.77 BRD4 (0.72) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL20346175 0.77 BRD4 (0.63) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL21013645 0.77 MEN1 (0.52) MEN1KMT2AALDH1A1MAPTESR1
SCHEMBL9599372 0.76 BRD4 (0.65) MEN1KMT2AALDH1A1MAPTESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236508-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT RESONAC CORPORATION (JP) 2023-07-27 US disclosed