SCHEMBL25899936

SCHEMBL25899936

C=C(C)C(=O)Oc1c(I)cc(I)cc1C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.34
NLRP3 Q96P20 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25985160 0.89 POLB (0.41) POLBNLRP3
SCHEMBL26827610 0.87
SCHEMBL26827622 0.85 POLB (0.33) POLB
SCHEMBL23426227 0.83 POLB (0.33) POLBNLRP3
SCHEMBL26312851 0.81 ELANE (0.33)
SCHEMBL22454822 0.79 GABRA1 (0.33)
SCHEMBL24776315 0.78 TTR (0.33)
SCHEMBL27277335 0.78 GABRA1 (0.32)
SCHEMBL26506873 0.77 ELANE (0.32)
SCHEMBL12119782 0.77 KDM4E (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023140364-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER 東京応化工業株式会社 2023-07-27 WO disclosed