Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.30 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.30 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.30 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.30 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.30 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.30 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.30 |
| ▸ | GABRA6 | Q16445 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25899936 | 0.89 | POLB (0.34) | POLBNLRP3 | |
| SCHEMBL22454822 | 0.83 | GABRA1 (0.33) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL25914037 | 0.82 | POLB (0.40) | POLBNLRP3 | |
| SCHEMBL24776315 | 0.82 | TTR (0.33) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL27277335 | 0.81 | GABRA1 (0.32) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL26827610 | 0.80 | — | — | |
| SCHEMBL26827622 | 0.79 | POLB (0.33) | POLB | |
| SCHEMBL22454821 | 0.79 | GABRA1 (0.35) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL19846271 | 0.77 | KDM4E (0.37) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL19846316 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230288800-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-14 | — | — | US | disclosed |
| US-20230259027-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-17 | — | — | US | disclosed |