Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | TP53 | P04637 | 3/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | P2RY10 | O00398 | 1/20 | 0.34 |
| ▸ | GPR34 | Q9UPC5 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | DGKA | P23743 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | PAM | P19021 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8997482 | 0.87 | ALDH1A1 (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL1412663 | 0.85 | TSHR (0.36) | TSHRALDH1A1P2RY10GPR34LMNA | |
| SCHEMBL1412680 | 0.78 | TSHR (0.33) | TSHRALDH1A1P2RY10GPR34THRB | |
| SCHEMBL27055855 | 0.77 | ALDH1A1 (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL4265829 | 0.77 | THRB (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL27675047 | 0.76 | ALDH1A1 (0.46) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL1412653 | 0.76 | P2RY10 (0.31) | TSHRP2RY10GPR34DGKA | |
| SCHEMBL11451395 | 0.76 | THRB (0.46) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL21843024 | 0.76 | ALDH1A1 (0.61) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| SCHEMBL27055860 | 0.76 | ALDH1A1 (0.46) | TSHRALDH1A1TP53HIF1ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3240047-B1 | PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2022-07-06 | — | — | EP | claimed |
| US-10920134-B2 | Method for preparing multilayer of nanocrystals, and organic-inorganic hybrid electroluminescence device comprising multilayer of nanocrystals prepared by the method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-02-16 | — | — | US | claimed |
| EP-3240047-A1 | PHOTOSENSITIVE SEMICONDUCTOR NANOCRYSTALS, PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME | Samsung Electronics Co., Ltd. (KR) | 2017-11-01 | — | — | EP | claimed |
| US-20170190966-A1 | METHOD FOR PREPARING MULTILAYER OF NANOCRYSTALS, AND ORGANIC-INORGANIC HYBRID ELECTROLUMINESCENCE DEVICE COMPRISING MULTILAYER OF NANOCRYSTALS PREPARED BY THE METHOD | SAMSUNG ELECTRONICS CO LTD (KR) | 2017-07-06 | — | — | US | claimed |
| EP-1526584-B1 | Method of forming electroluminescent semiconducting nanocrystal patterned layer for an organic-inorganic hybrid electroluminescent devices, and organic-inorganic hybrid electroluminescent device using the same. | SAMSUNG ELECTRONICS CO LTD (KR) | 2017-06-14 | — | — | EP | claimed |
| US-9598634-B2 | Method for preparing multilayer of nanocrystals, and organic-inorganic hybrid electroluminescence device comprising multilayer of nanocrystals prepared by the method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-03-21 | — | — | US | claimed |
| US-8758864-B2 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-06-24 | — | — | US | claimed |
| US-20120267616-A1 | METHOD FOR PREPARING MULTILAYER OF NANOCRYSTALS, AND ORGANIC-INORGANIC HYBRID ELECTROLUMINESCENCE DEVICE COMPRISING MULTILAYER OF NANOCRYSTALS PREPARED BY THE METHOD | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-25 | — | — | US | claimed |
| US-7476487-B2 | Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-13 | — | — | US | claimed |
| US-20080152857-A1 | Adhesive Compositon for Optical Disk, Cured Product and Article | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-06-26 | — | — | US | claimed |
| EP-1780251-A1 | ADHESIVE COMPOSITION FOR OPTICAL DISK, CURED PRODUCT AND ARTICLE | Nippon Kayaku Kabushiki Kaisha (JP) | 2007-05-02 | — | — | EP | claimed |
| US-20060199039-A1 | Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-09-07 | — | — | US | claimed |
| US-20050161666-A1 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-07-28 | — | — | US | claimed |
| EP-1526584-A2 | Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same | Samsung Electronics Co., Ltd (KR) | 2005-04-27 | — | — | EP | claimed |
| EP-0716102-B1 | TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS | SEIKO EPSON CORP (JP) | 2002-02-06 | — | — | EP | claimed |
| CN-111373015-B | Thiolated hydrophilic ligands for improving reliability of quantum dots in resin films | 昭荣化学工业株式会社 | 2024-06-04 | — | — | CN | disclosed |
| WO-2024104472-A1 | COMPOSITION AND USE THEREOF IN PHOTOELECTRIC FIELD | 浙江光昊光电科技有限公司 | 2024-05-23 | — | — | WO | disclosed |
| US-5736609-A | A POLYTHIO COMPOUND CONTAINING AT LEAST TWO MERCAPTO GROUPS, A POLYISO(THIO)CYANATE COMPOUND, AND A COMPOUND HAVING TWO OR MORE UNSATURATED REACTIVE GROUPS | MITSUI TOATSU CHEMICALS, INC. (JP) | 1998-04-07 | — | — | US | disclosed |
| EP-0751161-A2 | Sulfur-containing urethane-based resin composition, optical element and lens comprising this resin | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1997-01-02 | — | — | EP | disclosed |
| EP-0716102-A1 | TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS | SEIKO EPSON CORPORATION (JP) | 1996-06-12 | — | — | EP | disclosed |