SCHEMBL25933574

SCHEMBL25933574

Oc1ccc(C(c2ccc(O)c(C(F)(F)F)c2)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 5/20 0.64
ESR2 Q92731 3/20 0.64
KIF11 P52732 2/20 0.42
NR1I2 O75469 1/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
CYP2C9 P11712 1/20 0.41
MIF P14174 1/20 0.41
TYR P14679 1/20 0.41
ALOX15 P16050 1/20 0.41
HTT P42858 1/20 0.41
NFE2L2 Q16236 1/20 0.41
HSD17B10 Q99714 1/20 0.41
HSD17B1 P14061 2/20 0.40
HSD17B2 P37059 2/20 0.40
CES2 O00748 2/20 0.37
AR P10275 2/20 0.37
APP P05067 1/20 0.37
NQO2 P16083 1/20 0.35
MEN1 O00255 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25933462 0.86 ESR1 (0.60) ESR1ESR2KIF11NR1I2ALDH1A1
SCHEMBL18400612 0.86 ESR1 (0.60) ESR1ESR2KIF11NR1I2ALDH1A1
SCHEMBL18399451 0.83 ESR1 (0.56) ESR1ESR2KIF11NR1I2ALDH1A1
SCHEMBL21027 0.80 ESR1 (1.00) ESR1ESR2KIF11ALDH1A1LMNA
SCHEMBL4560440 0.80 ESR1 (1.00) ESR1ESR2KIF11ALDH1A1LMNA
SCHEMBL3686864 0.80 ESR1 (1.00) ESR1ESR2KIF11ALDH1A1LMNA
SCHEMBL13185901 0.80 ESR1 (0.67) ESR1ESR2KIF11NR1I2ALDH1A1
SCHEMBL17300225 0.79 ALDH1A1 (0.55) ESR1ESR2NR1I2ALDH1A1LMNA
SCHEMBL7769611 0.79 ESR1 (0.48) ESR1ESR2NR1I2ALDH1A1LMNA
SCHEMBL29785649 0.79 ESR1 (0.64) ESR1ESR2KIF11NR1I2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244148-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-08-03 US disclosed