SCHEMBL25946844

SCHEMBL25946844

CC(Br)C(=O)Oc1ccc(C(=O)O)c(F)c1F

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 9/20 0.38
▸ HSD17B10 Q99714 6/20 0.38
▸ HPGD P15428 4/20 0.38
▸ CFD P00746 2/20 0.38
▸ ALDH1A1 P00352 5/20 0.37
▸ USP2 O75604 1/20 0.37
▸ CYP2C19 P33261 1/20 0.37
▸ TDP1 Q9NUW8 2/20 0.37
▸ PTGS1 P23219 2/20 0.37
▸ PTGS2 P35354 2/20 0.37
▸ ESR1 P03372 2/20 0.37
▸ ITGB3 P05106 1/20 0.37
▸ ITGA2B P08514 1/20 0.37
▸ HMGB1 P09429 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ GGT1 P19440 1/20 0.37
▸ BLM P54132 1/20 0.37
▸ NAPRT Q6XQN6 1/20 0.37
▸ MAPT P10636 2/20 0.35
▸ MEN1 O00255 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22279463 0.84 ALDH1A1 (0.36) KDM4EHSD17B10HPGDCFDALDH1A1
SCHEMBL6698411 0.78 CFD (0.56) KDM4EHSD17B10HPGDCFDALDH1A1
SCHEMBL25946842 0.78 CFD (0.37) KDM4EHSD17B10HPGDCFDALDH1A1
SCHEMBL25946870 0.77 CDC25B (0.49) KDM4EHSD17B10HPGDCFDALDH1A1
SCHEMBL12715457 0.77 KDM4E (0.64) KDM4EHSD17B10HPGDALDH1A1USP2
SCHEMBL22945082 0.76 CFD (0.39) KDM4EHSD17B10HPGDCFDALDH1A1
SCHEMBL1961466 0.74 MAPT (0.55) KDM4EHSD17B10HPGDALDH1A1TDP1
SCHEMBL22279459 0.74 KDM4E (0.36) KDM4EHSD17B10HPGDCFDALDH1A1
SCHEMBL25946839 0.74 ALDH1A1 (0.49) KDM4EHSD17B10HPGDALDH1A1USP2
SCHEMBL2841395 0.73 KDM4E (0.38) KDM4EHSD17B10HPGDCFDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 — — US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 — — US disclosed
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